H01J 2237/00
Discharge tubes exposing object to beam
Official title: Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
H01J2237/00 (Discharge tubes exposing object to beam) appears on 18,743 US grants and 21,398 published applications in this corpus.
Search patents in H01J- Granted patents
- 18,743
- Published applications
- 21,398
- Assignees
- 2,920
- Inventors
- 27,362
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 9 | 0 |
| 1977 | 9 | 0 |
| 1978 | 11 | 0 |
| 1979 | 13 | 0 |
| 1980 | 8 | 0 |
| 1981 | 16 | 0 |
| 1982 | 14 | 0 |
| 1983 | 12 | 0 |
| 1984 | 33 | 0 |
| 1985 | 31 | 0 |
| 1986 | 38 | 0 |
| 1987 | 34 | 0 |
| 1988 | 36 | 0 |
| 1989 | 55 | 0 |
| 1990 | 53 | 0 |
| 1991 | 60 | 0 |
| 1992 | 129 | 0 |
| 1993 | 141 | 0 |
| 1994 | 151 | 0 |
| 1995 | 189 | 0 |
| 1996 | 191 | 0 |
| 1997 | 172 | 0 |
| 1998 | 249 | 0 |
| 1999 | 281 | 0 |
| 2000 | 288 | 0 |
| 2001 | 308 | 134 |
| 2002 | 338 | 409 |
| 2003 | 461 | 405 |
| 2004 | 416 | 516 |
| 2005 | 389 | 534 |
| 2006 | 415 | 590 |
| 2007 | 332 | 585 |
| 2008 | 429 | 673 |
| 2009 | 434 | 586 |
| 2010 | 500 | 557 |
| 2011 | 459 | 538 |
| 2012 | 504 | 576 |
| 2013 | 524 | 653 |
| 2014 | 669 | 702 |
| 2015 | 651 | 998 |
| 2016 | 746 | 872 |
| 2017 | 782 | 1002 |
| 2018 | 743 | 885 |
| 2019 | 889 | 1071 |
| 2020 | 992 | 1271 |
| 2021 | 882 | 1189 |
| 2022 | 942 | 1363 |
| 2023 | 835 | 1426 |
| 2024 | 927 | 1376 |
| 2025 | 1091 | 1452 |
| 2026 | 862 | 1035 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
- H01J 2237/30Electron or ion beam tubes for processing objectsIndexing code5,128
- H01J 2237/32Processing objects by plasma generationIndexing code4,940
- H01J 2237/26Electron or ion microscopesIndexing code3,559
- H01J 2237/20Positioning, supporting, modifying or maintaining the physical state of objects being observedIndexing code3,130
- H01J 2237/06SourcesIndexing code1,902
- H01J 2237/245Detection characterised by the variable being measuredIndexing code1,844
- H01J 2237/244Detection characterized by the detecting meansIndexing code1,768
- H01J 2237/02DetailsIndexing code1,675
All 23 subgroupsShow fewer
- H01J 2237/04Means for controlling the dischargeIndexing code1,622
- H01J 2237/15Means for deflecting or directing dischargeIndexing code987
- H01J 2237/22Treatment of dataIndexing code863
- H01J 2237/10LensesIndexing code642
- H01J 2237/153Correcting image defectsIndexing code625
- H01J 2237/004Charge control of objects or beamsIndexing code583
- H01J 2237/18Vacuum control meansIndexing code557
- H01J 2237/002Cooling arrangementsIndexing code496
- H01J 2237/248Components associated with the control of the tubeIndexing code436
- H01J 2237/05Arrangements for energy or mass analysisIndexing code429
- H01J 2237/006Details of gas suppliesIndexing code411
- H01J 2237/25Tubes for localised analysis using electron or ion beamsIndexing code347
- H01J 2237/21Focus adjustmentIndexing code313
- H01J 2237/16VesselsIndexing code242
- H01J 2237/03Mounting, supporting, spacing or insulating electrodesIndexing code222
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Most cited
By later US patents
- Particle-optical projection system1,466US 7,388,217 B2IMS Nanofabrication GmbH · 2008
- CVD Processing chamber1,003US 5,558,717 AAPPLIED Materials.Inc. · 1996
- Thermally floating pedestal collar in a chemical vapor deposition chamber805US 5,846,332 AAPPLIED Materials.Inc. · 1998
- Plasma uniformity control by gas diffuser hole design746US 8,083,853 B2APPLIED Materials.Inc. · 2011
- Processing apparatus and method for plasma processing739US 5,134,965 AHitachi, Ltd. · 1992