H01J 2237/05
Arrangements for energy or mass analysis
H01J2237/05 (Arrangements for energy or mass analysis) appears on 429 US grants and 431 published applications in this corpus.
Search patents in H01J- Granted patents
- 429
- Published applications
- 431
- Assignees
- 158
- Inventors
- 750
- Latest grant
- 15 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1979 | 1 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 1 | 0 |
| 1988 | 2 | 0 |
| 1989 | 2 | 0 |
| 1990 | 0 | 0 |
| 1991 | 1 | 0 |
| 1992 | 3 | 0 |
| 1993 | 2 | 0 |
| 1994 | 2 | 0 |
| 1995 | 2 | 0 |
| 1996 | 5 | 0 |
| 1997 | 2 | 0 |
| 1998 | 5 | 0 |
| 1999 | 4 | 0 |
| 2000 | 3 | 0 |
| 2001 | 2 | 1 |
| 2002 | 5 | 3 |
| 2003 | 4 | 4 |
| 2004 | 9 | 8 |
| 2005 | 7 | 7 |
| 2006 | 10 | 15 |
| 2007 | 7 | 18 |
| 2008 | 15 | 29 |
| 2009 | 18 | 24 |
| 2010 | 23 | 22 |
| 2011 | 22 | 19 |
| 2012 | 17 | 17 |
| 2013 | 24 | 14 |
| 2014 | 14 | 13 |
| 2015 | 19 | 23 |
| 2016 | 22 | 22 |
| 2017 | 18 | 18 |
| 2018 | 17 | 16 |
| 2019 | 20 | 17 |
| 2020 | 27 | 33 |
| 2021 | 29 | 19 |
| 2022 | 11 | 24 |
| 2023 | 14 | 19 |
| 2024 | 17 | 15 |
| 2025 | 14 | 16 |
| 2026 | 9 | 15 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Laser-based contrast control in transmission electron microscopy15 Sep 2026US 12,738,449 B2Yeda Research and Development Co. Ltd.
- Energy filter assembly for ion implantation system with at least one coupling element8 Sep 2026US 12,731,753 B2Mi2-Factory GmbH
- Devices and methods for electrostatic ion beam deflection and filtration28 Jul 2026US 12,695,047 B1Clocktower Engineering Inc.
- High-performance adaptable sampling system14 Jul 2026US 12,683,135 B2Tokyo Electron Limited
- Hybrid apparatus, system and techniques for mass analyzed ion beam10 Mar 2026US 12,573,579 B2APPLIED Materials.Inc.
- High-performance adaptable sampling system1 Oct 2026US 2026/0302145 A1Tokyo Electron Limited
- Ion implanter30 Jul 2026US 2026/0221385 A1Nissin Ion Equipment Co., Ltd.
- Charged particle beam device and inspection method using same2 Jul 2026US 2026/0188605 A1Hitachi High-Tech Corporation
- Charged particle beam energy width reduction apparatus, method of operating thereof, and charged particle beam device11 Jun 2026US 2026/0162924 A1ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
- Method of operating scanning electron microscope (sem) and method of manufacturing semiconductor device using the same11 Jun 2026US 2026/0162931 A1Samsung Electronics Co., Ltd.
Most cited
By later US patents
- Low energy, steered ion beam deposition system having high current at low pressure116US 5,206,516 AInternational Business Machines Corporation · 1993
- Ion source, ion beam processing/observation apparatus, charged particle beam apparatus, and method for observing cross section of sample88US 8,779,400 B2Hitachi High-Technologies Corporation · 2014
- High current ribbon beam ion implanter73US 5,834,786 ADiamond Semiconductor Group, Inc. · 1998
- Scanning electron microscope66US 6,847,038 B2Hitachi, Ltd. · 2005
- Parallel ion optics and apparatus for high current low energy ion beams55US 5,811,820 AMassively Parallel Instruments, Inc. · 1998