Parallel ion optics and apparatus for high current low energy ion beams
AssigneeMassively Parallel Instruments, Inc.
InventorsNicholas J. Kirchner, Felix G. Gutman, Oleg V. Alexandrov, Efim A. Dynin
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AssigneeMassively Parallel Instruments, Inc.
InventorsNicholas J. Kirchner, Felix G. Gutman, Oleg V. Alexandrov, Efim A. Dynin
Estimating the term…
A device for the parallel processing of ions is provided. The device may be utilized for thin film deposition or ion implantation and may include the following: an ion source, ion capture and storage ion optics, mass selection ion optics, neutral trapping elements, extraction ion optics, beam neutralization mechanisms, and a substrate on which deposition and thin film growth occurs is provided. Ions are captured and stored within a closely packed array of parallel ion conducting channels. The ion conducting channels transport high current low energy ions from the ion source to irradiate the substrate target. During transport, ion species can be mass selected, merged with ions from multiple sources, and undergo gas phase charge exchange ion molecule reactions. Additionally, neutrals from the ion source, ion-molecule reaction reagent gases, residual background gas, or neutralization of ions may be eliminated from the processing stream by turbo pumping, cryo pumping, and cryocondensation on some of the ion optic elements. Different types of ion optic elements, including elements which are parallel or perpendicular to the ion path, and neutral trapping elements may be combined in different ways to achieve thin film ion deposition over a large homogenous substrate surface.
An apparatus for irradiating a substrate with ions, comprising:
An apparatus for manipulating ions, comprising:
An apparatus for manipulating ions, comprising:
An apparatus for manipulating ions, comprising:
An apparatus for manipulating ions, comprising:
An apparatus for manipulating ions, comprising:
An apparatus for manipulating ions, comprising:
An apparatus for manipulating ions, comprising:
An apparatus for manipulating ions, comprising:
An apparatus for manipulating ions, comprising:
An apparatus for manipulating ions, comprising:
A method of irradiating a substrate with an apparatus having an ion source, a plurality of electrode sheets each of which has a plurality of openings aligned parallel with openings in adjacent sheets defining a plurality of ion channels, with at least one spacer coupled between adjacent electrode sheets, a substrate support, a vacuum enclosure enclosing said ion source, said plurality of electrode sheets, said at least one spacer, and said substrate support, and an electronic device coupled to said electrode sheets, said electronic device adapted to selectively apply voltages to said plurality of electrode sheets in order to translate ions in said at least one ion channel, said method comprising the steps of:
A method of plasma ion extraction of ions from an ion source onto a substrate, comprising the steps of:
Dependencies are inferred from the claim text.