H01J 2237/057
Energy or mass filtering
H01J2237/057 (Energy or mass filtering) appears on 297 US grants and 306 published applications in this corpus.
Search patents in H01J- Granted patents
- 297
- Published applications
- 306
- Assignees
- 112
- Inventors
- 533
- Latest grant
- 15 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1988 | 1 | 0 |
| 1989 | 1 | 0 |
| 1990 | 0 | 0 |
| 1991 | 1 | 0 |
| 1992 | 0 | 0 |
| 1993 | 1 | 0 |
| 1994 | 1 | 0 |
| 1995 | 2 | 0 |
| 1996 | 3 | 0 |
| 1997 | 1 | 0 |
| 1998 | 3 | 0 |
| 1999 | 2 | 0 |
| 2000 | 2 | 0 |
| 2001 | 1 | 1 |
| 2002 | 4 | 3 |
| 2003 | 2 | 3 |
| 2004 | 6 | 4 |
| 2005 | 4 | 5 |
| 2006 | 7 | 8 |
| 2007 | 5 | 14 |
| 2008 | 10 | 21 |
| 2009 | 13 | 15 |
| 2010 | 14 | 13 |
| 2011 | 17 | 11 |
| 2012 | 11 | 12 |
| 2013 | 14 | 9 |
| 2014 | 10 | 11 |
| 2015 | 16 | 19 |
| 2016 | 18 | 17 |
| 2017 | 15 | 12 |
| 2018 | 13 | 13 |
| 2019 | 14 | 15 |
| 2020 | 21 | 24 |
| 2021 | 23 | 13 |
| 2022 | 9 | 14 |
| 2023 | 8 | 14 |
| 2024 | 10 | 9 |
| 2025 | 8 | 14 |
| 2026 | 6 | 12 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Laser-based contrast control in transmission electron microscopy15 Sep 2026US 12,738,449 B2Yeda Research and Development Co. Ltd.
- Energy filter assembly for ion implantation system with at least one coupling element8 Sep 2026US 12,731,753 B2Mi2-Factory GmbH
- Devices and methods for electrostatic ion beam deflection and filtration28 Jul 2026US 12,695,047 B1Clocktower Engineering Inc.
- Hybrid apparatus, system and techniques for mass analyzed ion beam10 Mar 2026US 12,573,579 B2APPLIED Materials.Inc.
- Ion implantation device with energy filter having additional thermal energy dissipation surface area3 Mar 2026US 12,567,559 B2Mi2-Factory GmbH
- Ion implanter30 Jul 2026US 2026/0221385 A1Nissin Ion Equipment Co., Ltd.
- Charged particle beam device and inspection method using same2 Jul 2026US 2026/0188605 A1Hitachi High-Tech Corporation
- Charged particle beam energy width reduction apparatus, method of operating thereof, and charged particle beam device11 Jun 2026US 2026/0162924 A1ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
- Method of operating scanning electron microscope (sem) and method of manufacturing semiconductor device using the same11 Jun 2026US 2026/0162931 A1Samsung Electronics Co., Ltd.
- Beam conditioning for defect control in beamline ion implanter14 May 2026US 2026/0135063 A1APPLIED Materials.Inc.
Most cited
By later US patents
- Ion source, ion beam processing/observation apparatus, charged particle beam apparatus, and method for observing cross section of sample88US 8,779,400 B2Hitachi High-Technologies Corporation · 2014
- Method and apparatus for deflecting charged particles48US 6,160,262 ANissin Electric Co., Ltd. · 2000
- Projection electron beam apparatus and defect inspection system using the apparatus46US 8,035,082 B2Kabushiki Kaisha Toshiba · 2011
- Beam tuning with automatic magnet pole rotation for ion implanters43US 7,476,855 B2Axcelis Technologies, Inc. · 2009
- Inspection system by charged particle beam and method of manufacturing devices using the system41US 7,601,972 B2Ebara Corporation · 2009