G03F
Photomechanical production of textured or patterned surfaces
Official title: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G)
G03F (Photomechanical production of textured or patterned surfaces) appears on 66,205 US grants and 62,526 published applications in this corpus.
Search patents in G03F- Granted patents
- 66,205
- Published applications
- 62,526
- Assignees
- 6,485
- Inventors
- 70,221
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 266 | 0 |
| 1977 | 234 | 0 |
| 1978 | 244 | 0 |
| 1979 | 223 | 0 |
| 1980 | 280 | 0 |
| 1981 | 446 | 0 |
| 1982 | 320 | 0 |
| 1983 | 376 | 0 |
| 1984 | 365 | 0 |
| 1985 | 462 | 0 |
| 1986 | 470 | 0 |
| 1987 | 525 | 0 |
| 1988 | 491 | 0 |
| 1989 | 758 | 0 |
| 1990 | 740 | 0 |
| 1991 | 804 | 0 |
| 1992 | 729 | 0 |
| 1993 | 804 | 0 |
| 1994 | 927 | 0 |
| 1995 | 802 | 0 |
| 1996 | 870 | 0 |
| 1997 | 1029 | 0 |
| 1998 | 1324 | 0 |
| 1999 | 1406 | 0 |
| 2000 | 1448 | 0 |
| 2001 | 1623 | 708 |
| 2002 | 1667 | 2115 |
| 2003 | 1902 | 2426 |
| 2004 | 1956 | 2660 |
| 2005 | 1691 | 3144 |
| 2006 | 2028 | 3165 |
| 2007 | 1793 | 2924 |
| 2008 | 1852 | 3031 |
| 2009 | 1782 | 2936 |
| 2010 | 2200 | 2745 |
| 2011 | 2030 | 2414 |
| 2012 | 2092 | 2340 |
| 2013 | 2195 | 2298 |
| 2014 | 2484 | 2273 |
| 2015 | 2286 | 2469 |
| 2016 | 2251 | 2335 |
| 2017 | 2156 | 2091 |
| 2018 | 1974 | 2236 |
| 2019 | 2148 | 2361 |
| 2020 | 2057 | 2425 |
| 2021 | 1825 | 2241 |
| 2022 | 1703 | 2383 |
| 2023 | 1673 | 2462 |
| 2024 | 1608 | 2417 |
| 2025 | 1702 | 2212 |
| 2026 | 1184 | 1715 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Main groups
Granted patents with any code in the group
Recent patents
- Method of fabricating metal mask6 Oct 2026US 12,752,329 B2Darwin Precisions Corporation
- Techniques for improved critical dimension metrology6 Oct 2026US 12,754,013 B2Uchicago Argonne, LLC
- Method for electron beam-induced processing of a defect of a microlithographic photomask6 Oct 2026US 12,754,470 B2Carl Zeiss SMT GmbH
- Mask optimization for layer accounting for overlap with other layers6 Oct 2026US 12,754,471 B2D2S, Inc.
- Mask optimization for layer based on comparison of components in layer to components in other layers6 Oct 2026US 12,754,472 B2D2S, Inc.
- Cultivating methods and apparatuses8 Oct 2026US 2026/0305597 A1
- Imprint apparatus, imprint method and article manufacturing method8 Oct 2026US 2026/0307325 A1Canon Kabushiki Kaisha
- Method for manufacturing optical element, and optical element8 Oct 2026US 2026/0307345 A1Canon Kabushiki Kaisha
- Method for Multicolor Lithography Using Mechanical Force8 Oct 2026US 2026/0308288 A1California Institute of Technology
- Cooling system, a semiconductor apparatus including the same, and a method of replacing a filter using the same8 Oct 2026US 2026/0309362 A1Samsung Electronics Co., Ltd.
Most cited
By later US patents
- Cut-mask patterning process for fin-like field effect transistor (FinFET) device3,286US 9,236,267 B2Taiwan Semiconductor Manufacturing Company.Ltd · 2016
- Large scale photolithographic solid phase synthesis of polypeptides and receptor binding screening thereof1,998US 5,143,854 AAffymax Technologies N.V. · 1992
- Array of oligonucleotides on a solid substrate1,585US 5,445,934 AAffymax Technologies N.V. · 1995
- Apparatus for production of three-dimensional objects by stereolithography1,471US 4,575,330 AUVP, Inc. · 1986
- Arrays of materials attached to a substrate1,410US 5,744,305 AAffymetrix, Inc. · 1998