US 12,754,013 B2 · Techniques for improved critical dimension metrology

Abstract

Techniques for improving critical dimension metrology are disclosed herein. An example method includes emitting a radiation beam comprising (i) a primary beam that passes through a sample and scatters into a set of scattered beams and (ii) a reference beam. The method further includes detecting the reference beam and a portion of the set of scattered beams, wherein the reference beam and the portion of the set of scattered beams superimpose at the detector as a hologram of the sample to encode structural information associated with at least one lithographic pattern of the sample. The method further includes executing a dimensioning algorithm configured to: determine one or more critical dimensions of the sample based on one or more properties of the hologram and reconstruct a real-space image of the sample based on the hologram. The method further includes causing the critical dimensions or the real-space image to be displayed.

Claims20

Dependent claims

A computer-implemented method for improved critical dimension metrology, comprising:

emitting, by an emitter, a radiation beam comprising (i) a primary beam that passes through a sample and scatters into a set of scattered beams and (ii) a reference beam, wherein the sample includes one or more lithographic patterns;
detecting, by a detector, the reference beam and a portion of the set of scattered beams, wherein the reference beam and the portion of the set of scattered beams superimpose at the detector as a hologram of the sample to encode structural information associated with at least one lithographic pattern of the one or more lithographic patterns;
executing, by one or more processors, a dimensioning algorithm configured to:
determine one or more critical dimensions of the sample based on one or more properties of the hologram, and
reconstruct a real-space image of the sample based on the hologram;
and
causing, by the one or more processors, the one or more critical dimensions or the real-space image to be displayed for viewing by a user.

4 more elements

A system for improved critical dimension metrology, comprising:

an emitter configured to emit radiation;
a detector configured to detect the radiation;
one or more processors;
and
one or more memories communicatively coupled with the one or more processors, the emitter, and the detector, wherein the one or more memories store computer-executable instructions thereon that, when executed by the one or more processors, cause the system to:
emit, by the emitter, a radiation beam comprising (i) a primary beam that passes through a sample and scatters into a set of scattered beams and (ii) a reference beam, wherein the sample includes one or more lithographic patterns;
detect, by the detector, the reference beam and a portion of the set of scattered beams, wherein the reference beam and the portion of the set of scattered beams superimpose at the detector as a hologram of the sample to encode structural information associated with at least one lithographic pattern of the one or more lithographic patterns;
execute a dimensioning algorithm configured to:
determine one or more critical dimensions of the sample based on one or more properties of the hologram, and
reconstruct a real-space image of the sample based on the hologram;
and
cause the one or more critical dimensions or the real-space image to be displayed for viewing by a user.

9 more elements

Dependencies are inferred from the claim text.

Techniques for improved critical dimension metrology

Life of this patent

Techniques for improved critical dimension metrology

Life of this patent

Abstract

Claims20