G03F 9/00
Registration or positioning of originals, masks, frames, photographic sheets or textured or
Official title: Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (G03F7/22 takes precedence; preparation of photographic masks G03F1/00; within photographic printing apparatus for making copies G03B27/00)
G03F9/00 (Registration or positioning of originals, masks, frames, photographic sheets or textured or) appears on 5,032 US grants and 3,957 published applications in this corpus.
Search patents in G03F- Granted patents
- 5,032
- Published applications
- 3,957
- Assignees
- 788
- Inventors
- 6,559
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 23 | 0 |
| 1977 | 19 | 0 |
| 1978 | 17 | 0 |
| 1979 | 18 | 0 |
| 1980 | 14 | 0 |
| 1981 | 21 | 0 |
| 1982 | 32 | 0 |
| 1983 | 48 | 0 |
| 1984 | 36 | 0 |
| 1985 | 52 | 0 |
| 1986 | 63 | 0 |
| 1987 | 90 | 0 |
| 1988 | 51 | 0 |
| 1989 | 81 | 0 |
| 1990 | 50 | 0 |
| 1991 | 48 | 0 |
| 1992 | 70 | 0 |
| 1993 | 63 | 0 |
| 1994 | 71 | 0 |
| 1995 | 78 | 0 |
| 1996 | 85 | 0 |
| 1997 | 92 | 0 |
| 1998 | 142 | 0 |
| 1999 | 132 | 0 |
| 2000 | 110 | 0 |
| 2001 | 129 | 60 |
| 2002 | 115 | 127 |
| 2003 | 139 | 151 |
| 2004 | 119 | 181 |
| 2005 | 144 | 222 |
| 2006 | 171 | 225 |
| 2007 | 154 | 204 |
| 2008 | 147 | 182 |
| 2009 | 127 | 195 |
| 2010 | 119 | 139 |
| 2011 | 128 | 155 |
| 2012 | 123 | 118 |
| 2013 | 141 | 122 |
| 2014 | 114 | 108 |
| 2015 | 127 | 146 |
| 2016 | 129 | 125 |
| 2017 | 126 | 136 |
| 2018 | 153 | 163 |
| 2019 | 189 | 220 |
| 2020 | 193 | 192 |
| 2021 | 175 | 149 |
| 2022 | 142 | 155 |
| 2023 | 129 | 150 |
| 2024 | 106 | 135 |
| 2025 | 116 | 99 |
| 2026 | 71 | 98 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Pattern forming method, semiconductor device manufacturing method, and template6 Oct 2026US 12,754,487 B2Kioxia Corporation
- Intensity measurements using off-axis illumination6 Oct 2026US 12,754,488 B2ASML Netherlands B. V.
- Height measurement sensor using derivative of periodic points22 Sep 2026US 12,742,636 B2ASML Netherlands B. V.
- Method for determining a focus actuation profile for one or more actuators of a lithographic exposure apparatus22 Sep 2026US 12,743,034 B2ASML Netherlands B. V.
- Method of spatially aligning a patterning device and a substrate22 Sep 2026US 12,743,035 B2ASML Netherlands B. V.
- System and Process for Imprinting8 Oct 2026US 2026/0310071 A1Morphotonics Holding B.V.
- Nanoimprint lithography mold and nanoimprint lithography using same8 Oct 2026US 2026/0310109 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Illumination apparatus, measurement apparatus, substrate processing apparatus, and method for manufacturing article1 Oct 2026US 2026/0299436 A1Canon Kabushiki Kaisha
- System and Process for Imprinting1 Oct 2026US 2026/0299444 A1Morphotonics Holding B.V.
- Mark detection method, mark detection apparatus, pattern formation apparatus, and article manufacturing method1 Oct 2026US 2026/0305247 A1Canon Kabushiki Kaisha
Most cited
By later US patents
- Focusing and tilting adjustment system for lithography aligner, manufacturing apparatus or inspection apparatus1,042US 5,825,043 ANikon Precision Inc. · 1998
- Nanoimprint lithography828US 5,772,905 ARegents of the University of Minnesota · 1998
- Lithographic apparatus and device manufacturing method764US 6,952,253 B2ASML Netherlands B. V. · 2005
- Projection exposure apparatus having an off-axis alignment system and method of alignment therefor744US 5,243,195 ANikon Corporation · 1993
- Projection exposure apparatus and method with workpiece area detection611US 6,191,429 B1Nikon Precision Inc. · 2001