Lithographic apparatus and device manufacturing method

A lithographic projection apparatus comprising:

• a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern;
• a substrate table configured to hold a substrate;
• a projection system configured to project the patterned beam onto a target portion of the substrate;
• and
• a liquid supply system configured to at least partly fill a space between said projection system and said substrate with a liquid, wherein said space is in liquid connection with a liquid reservoir through a duct, and the minimum cross sectional area of said duct in a plane perpendicular to the direction of fluid flow is at least
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• where ΔV is the volume of liquid which has to be removed from said space within time tmin, L is the length of the duct, η is viscosity of liquid in said space and ΔPmax is the maximum allowable pressure on an element of said projection system.

A lithographic projection apparatus comprising:

• a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern;
• a substrate table configured to hold a substrate;
• a projection system configured to project the patterned beam onto a target portion of the substrate;
• a liquid supply system configured to at least partly fill a space between said projection system and said substrate with a liquid, said liquid supply system comprising on a top surface of liquid in said liquid supply system, a wave suppression device configured to suppress development of waves.

A lithographic projection apparatus comprising:

• a support structure configured to hold a patterning device and movable in a scanning direction, the patterning device configured to pattern a beam of radiation according to a desired pattern;
• a substrate table configured to hold a substrate and movable in a scanning direction;
• a projection system configured to project the patterned beam onto a target portion of the substrate using a scanning exposure;
• and
• a liquid supply system configured provide a liquid, through which said beam is to be projected, to a space between said projection system and said substrate, said liquid supply system comprising:
• a liquid confinement structure extending along at least a part of the boundary of said space between said projection system and said substrate table,
• a gas inlet formed in a face of said structure that opposes said substrate to supply gas,
• a gas outlet formed in a face of said structure that opposes said substrate to extract gas,
• an inlet to supply said liquid to said substrate, and
• an outlet to remove said liquid after said liquid has passed under said projection system.