G03F 9/70
Registration or positioning of originals, masks, frames, photographic sheets or textured or
Official title: {for microlithography (measuring printed patterns for monitoring overlay G03F7/70633 or focus G03F7/70641; projection system adjustment G03F7/70258; position control G03F7/70775)}
G03F9/70 (Registration or positioning of originals, masks, frames, photographic sheets or textured or) appears on 4,594 US grants and 3,734 published applications in this corpus.
Search patents in G03F- Granted patents
- 4,594
- Published applications
- 3,734
- Assignees
- 630
- Inventors
- 5,884
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 17 | 0 |
| 1977 | 15 | 0 |
| 1978 | 10 | 0 |
| 1979 | 10 | 0 |
| 1980 | 11 | 0 |
| 1981 | 16 | 0 |
| 1982 | 28 | 0 |
| 1983 | 39 | 0 |
| 1984 | 29 | 0 |
| 1985 | 44 | 0 |
| 1986 | 59 | 0 |
| 1987 | 81 | 0 |
| 1988 | 43 | 0 |
| 1989 | 70 | 0 |
| 1990 | 45 | 0 |
| 1991 | 36 | 0 |
| 1992 | 61 | 0 |
| 1993 | 49 | 0 |
| 1994 | 56 | 0 |
| 1995 | 64 | 0 |
| 1996 | 71 | 0 |
| 1997 | 82 | 0 |
| 1998 | 127 | 0 |
| 1999 | 121 | 0 |
| 2000 | 102 | 0 |
| 2001 | 106 | 57 |
| 2002 | 100 | 113 |
| 2003 | 128 | 137 |
| 2004 | 99 | 147 |
| 2005 | 126 | 202 |
| 2006 | 151 | 214 |
| 2007 | 143 | 196 |
| 2008 | 138 | 174 |
| 2009 | 121 | 190 |
| 2010 | 115 | 128 |
| 2011 | 125 | 144 |
| 2012 | 118 | 110 |
| 2013 | 135 | 118 |
| 2014 | 109 | 103 |
| 2015 | 120 | 140 |
| 2016 | 123 | 121 |
| 2017 | 119 | 128 |
| 2018 | 147 | 153 |
| 2019 | 184 | 212 |
| 2020 | 181 | 184 |
| 2021 | 173 | 146 |
| 2022 | 139 | 146 |
| 2023 | 120 | 147 |
| 2024 | 102 | 133 |
| 2025 | 116 | 96 |
| 2026 | 70 | 95 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
- G03F 9/7003Alignment type or strategy2,247
- G03F 9/7073Alignment marks and their environment1,271
- G03F 9/7088Alignment mark detection980
- G03F 9/7049Technique695
- G03F 9/7092Signal processing257
- G03F 9/7065Production of alignment light236
- G03F 9/7069Alignment mark illumination154
- G03F 9/7096Arrangement, mounting, housing, environment, cleaning or maintenance of apparatus139
Recent patents
- Pattern forming method, semiconductor device manufacturing method, and template6 Oct 2026US 12,754,487 B2Kioxia Corporation
- Intensity measurements using off-axis illumination6 Oct 2026US 12,754,488 B2ASML Netherlands B. V.
- Height measurement sensor using derivative of periodic points22 Sep 2026US 12,742,636 B2ASML Netherlands B. V.
- Method for determining a focus actuation profile for one or more actuators of a lithographic exposure apparatus22 Sep 2026US 12,743,034 B2ASML Netherlands B. V.
- Method of spatially aligning a patterning device and a substrate22 Sep 2026US 12,743,035 B2ASML Netherlands B. V.
- System and Process for Imprinting8 Oct 2026US 2026/0310071 A1Morphotonics Holding B.V.
- Nanoimprint lithography mold and nanoimprint lithography using same8 Oct 2026US 2026/0310109 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Illumination apparatus, measurement apparatus, substrate processing apparatus, and method for manufacturing article1 Oct 2026US 2026/0299436 A1Canon Kabushiki Kaisha
- System and Process for Imprinting1 Oct 2026US 2026/0299444 A1Morphotonics Holding B.V.
- Mark detection method, mark detection apparatus, pattern formation apparatus, and article manufacturing method1 Oct 2026US 2026/0305247 A1Canon Kabushiki Kaisha
Most cited
By later US patents
- Focusing and tilting adjustment system for lithography aligner, manufacturing apparatus or inspection apparatus1,042US 5,825,043 ANikon Precision Inc. · 1998
- Nanoimprint lithography828US 5,772,905 ARegents of the University of Minnesota · 1998
- Lithographic apparatus and device manufacturing method764US 6,952,253 B2ASML Netherlands B. V. · 2005
- Projection exposure apparatus having an off-axis alignment system and method of alignment therefor744US 5,243,195 ANikon Corporation · 1993
- Projection exposure apparatus and method with workpiece area detection611US 6,191,429 B1Nikon Precision Inc. · 2001