G03F 9/7073
Alignment marks and their environment
Official title: {Alignment marks and their environment (marks specific to masks G03F1/42; marks specific to molds or stamps G03F7/0002; overlay marks G03F7/70633; marks applied to semiconductor devices H10W46/00)}
G03F9/7073 (Alignment marks and their environment) appears on 1,271 US grants and 1,184 published applications in this corpus.
Search patents in G03F- Granted patents
- 1,271
- Published applications
- 1,184
- Assignees
- 317
- Inventors
- 2,309
- Latest grant
- 22 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 1 | 0 |
| 1978 | 2 | 0 |
| 1979 | 0 | 0 |
| 1980 | 1 | 0 |
| 1981 | 1 | 0 |
| 1982 | 9 | 0 |
| 1983 | 11 | 0 |
| 1984 | 2 | 0 |
| 1985 | 6 | 0 |
| 1986 | 14 | 0 |
| 1987 | 14 | 0 |
| 1988 | 6 | 0 |
| 1989 | 15 | 0 |
| 1990 | 6 | 0 |
| 1991 | 7 | 0 |
| 1992 | 6 | 0 |
| 1993 | 11 | 0 |
| 1994 | 7 | 0 |
| 1995 | 6 | 0 |
| 1996 | 11 | 0 |
| 1997 | 6 | 0 |
| 1998 | 12 | 0 |
| 1999 | 13 | 0 |
| 2000 | 22 | 0 |
| 2001 | 27 | 20 |
| 2002 | 29 | 48 |
| 2003 | 51 | 44 |
| 2004 | 35 | 56 |
| 2005 | 53 | 79 |
| 2006 | 48 | 81 |
| 2007 | 65 | 84 |
| 2008 | 62 | 58 |
| 2009 | 47 | 61 |
| 2010 | 38 | 41 |
| 2011 | 57 | 53 |
| 2012 | 51 | 31 |
| 2013 | 45 | 33 |
| 2014 | 38 | 30 |
| 2015 | 35 | 41 |
| 2016 | 26 | 21 |
| 2017 | 32 | 31 |
| 2018 | 38 | 41 |
| 2019 | 45 | 65 |
| 2020 | 49 | 55 |
| 2021 | 54 | 41 |
| 2022 | 42 | 45 |
| 2023 | 32 | 38 |
| 2024 | 30 | 30 |
| 2025 | 32 | 33 |
| 2026 | 20 | 24 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Alignment method based on holographic lithography, system and device22 Sep 2026US 12,743,036 B2Hyper-Optics (Beijing) Technologies Ltd.
- Alignment mark and imprinting method15 Sep 2026US 12,740,434 B2Kioxia Corporation
- Metrology method and apparatus8 Sep 2026US 12,730,388 B2ASML Netherlands B. V.
- Mask plate, alignment mark and photolithography system4 Aug 2026US 12,699,333 B2Semiconductor Manufacturing International (Beijing) Corporation
- Multiple targets on substrate layers for layer alignment21 Jul 2026US 12,687,793 B2Intel Corporation
- Scalable nanoimprint manufacturing of functional multi-layer metasurface devices24 Sep 2026US 2026/0287787 A1Arizona Board of Regents on behalf of Arizona State University
- Alignment apparatus, lithography apparatus, and article manufacturing method17 Sep 2026US 2026/0277125 A1Canon Kabushiki Kaisha
- Semiconductor substrate having a hybrid alignment structure3 Sep 2026US 2026/0259508 A1Infineon Technologies AG
- Positioning system and method of forming the same3 Sep 2026US 2026/0259510 A1Agency for Science, Technology and Research
- Semiconductor device having alignment mark27 Aug 2026US 2026/0251989 A1Micron Technology, Inc.
Most cited
By later US patents
- Lithographic apparatus, device manufacturing method, and device manufactured thereby234US 6,961,116 B2ASML Netherlands B. V. · 2005
- On-axis interferometric alignment of plates using the spatial phase of interference patterns174US 5,414,514 AMassachusetts Institute of Technology · 1995
- Semiconductor wafer having a layer-to-layer alignment mark and method for fabricating the same170US 6,288,454 B1LSI Logic Corporation · 2001
- Method and apparatus for the alignment of a substrate167US 5,493,403 ANikon Corporation · 1996
- Stamp for a lithographic process159US 5,817,242 AInternational Business Machines.Corp · 1998