G03F 9/708
Mark formation
Official title: {Mark formation}
G03F9/708 (Mark formation) appears on 266 US grants and 276 published applications in this corpus.
Search patents in G03F- Granted patents
- 266
- Published applications
- 276
- Assignees
- 125
- Inventors
- 600
- Latest grant
- 4 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1996 | 3 | 0 |
| 1997 | 1 | 0 |
| 1998 | 1 | 0 |
| 1999 | 6 | 0 |
| 2000 | 8 | 0 |
| 2001 | 6 | 2 |
| 2002 | 4 | 11 |
| 2003 | 11 | 10 |
| 2004 | 9 | 13 |
| 2005 | 15 | 20 |
| 2006 | 12 | 20 |
| 2007 | 8 | 19 |
| 2008 | 14 | 18 |
| 2009 | 14 | 16 |
| 2010 | 13 | 12 |
| 2011 | 13 | 14 |
| 2012 | 12 | 8 |
| 2013 | 12 | 8 |
| 2014 | 9 | 11 |
| 2015 | 11 | 9 |
| 2016 | 6 | 9 |
| 2017 | 6 | 6 |
| 2018 | 13 | 16 |
| 2019 | 15 | 9 |
| 2020 | 10 | 9 |
| 2021 | 4 | 7 |
| 2022 | 8 | 9 |
| 2023 | 4 | 7 |
| 2024 | 6 | 3 |
| 2025 | 8 | 6 |
| 2026 | 4 | 4 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Mask plate, alignment mark and photolithography system4 Aug 2026US 12,699,333 B2Semiconductor Manufacturing International (Beijing) Corporation
- Semiconductor structure body and method for manufacturing semiconductor structure body with alignment between stories of the same12 May 2026US 12,625,440 B2Kioxia Corporation
- Electronic devices comprising overlay marks24 Mar 2026US 12,588,515 B2Micron Technology, Inc.
- Photomask, optical-waveguide, optical circuit and method of manufacturing an optical-waveguide3 Feb 2026US 12,541,145 B2NTT, Inc.
- Image device and motherboard for image device16 Sep 2025US 12,416,869 B2Seiko Epson Corporation
- Topology optimized alignment marks6 Aug 2026US 2026/0227718 A1ASML Netherlands B. V.
- Substrates for calibration of a lithographic apparatus23 Jul 2026US 2026/0211337 A1ASML Netherlands B. V.
- Systems and processes for persistent marking of flexo plates with isolated microstructures and plates marked therewith4 Jun 2026US 2026/0151992 A1Esko-Graphics Imaging GmbH
- Method and structure for lithography alignment30 Apr 2026US 2026/0118786 A1Institute of Microelectronics, Chinese Academy of Sciences
- Fiducial pattern alignment techniques14 Aug 2025US 2025/0258445 A1Onto Innovation Inc.
Most cited
By later US patents
- Semiconductor wafer having a layer-to-layer alignment mark and method for fabricating the same170US 6,288,454 B1LSI Logic Corporation · 2001
- Method for creating and preserving alignment marks for aligning mask layers in integrated circuit manufacture74US 6,261,918 B1Conexant Systems, Inc. · 2001
- Aligning method47US 5,532,091 ANikon Corporation · 1996
- Lithographic apparatus and device manufacturing method with reduced scribe lane usage for substrate measurement46US 7,486,408 B2ASML Netherlands B. V. · 2009
- Method of alignment for buried structures formed by surface transformation of empty spaces in solid state materials45US 6,579,738 B2Micron Technology, Inc. · 2003