Substrates for calibration of a lithographic apparatus

Abstract

A method of calibrating a lithographic apparatus, the method including: obtaining a substrate having a Young's modulus which is substantially invariant to the orientation of an axis within the plane of the substrate along which the Young's modulus is defined and being provided with reference features; clamping the substrate to a substrate table of the lithographic apparatus; providing patterned features to the clamped substrate using the lithographic apparatus, each patterned feature being provided in proximity to a corresponding reference feature; measuring the position of each patterned feature relative to its corresponding reference feature; and calibrating a grid associated with positioning of substrates by the lithographic apparatus based on the measured positions of the patterned features.

Dependencies are inferred from the claim text.