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AssigneeASML Netherlands B.V.
InventorsMaurits Van Der Schaar, Arie Jeffrey Den Boef, Richard Johannes Franciscus Van Haren, Everhardus Cornelis Mos
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In a device manufacturing method and lithographic apparatus wherein a pattern is transferred from a patterning device onto a substrate, a measurement target is provided on the substrate in a process enabling execution of a substrate measurement using radiation of a first wavelength. Subsequently the measurement target is transformed in a grid of conducting material, the grid having grid openings which are smaller than the first wavelength. The space in the scribe lane where the measurement target was, is now shielded and may be used again in further layers or processing steps of the substrate.
A lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate, wherein the lithographic apparatus is configured to:
A device manufacturing method comprising transferring a pattern from a patterning device onto a substrate, the method comprising:
A device manufactured according to a method, the method comprising:
Dependencies are inferred from the claim text.