Patent search

US 2026/0324369 A1Published 15 Oct 2026

Patterning method using secondary resist surface functionalization for mask formation

Tokyo Electron Limited

US 2026/0324365 A1Published 15 Oct 2026

Systems and methods that use infrared (ir) spectroscopy to monitor process chemicals utilized in a semiconductor process

Tokyo Electron Limited

US 2026/0324131 A1Published 15 Oct 2026

Method for manufacturing photonic crystal gallium nitride light-emitting element, and lighting device

Nitride Semiconductors Co., Ltd.

US 2026/0323806 A1Published 15 Oct 2026

Target supply method and electronic device manufacturing method

Gigaphoton Inc.

US 2026/0322065 A1Published 15 Oct 2026

Laser device and electronic device manufacturing method

Gigaphoton Inc.

US 2026/0322063 A1Published 15 Oct 2026

Laser system, adjustment method of laser system, and electronic device manufacturing method

Gigaphoton Inc.

US 2026/0322058 A1Published 15 Oct 2026

Optical amplifier and apparatus therefor

ASML Netherlands B.V.

US 2026/0319434 A1Published 15 Oct 2026

Apparatus and method for fabricating reflection-type volume holographic gratings

Meta-Bounds Inc.

US 2026/0319390 A1Published 15 Oct 2026

Data and rule based hybrid sampling for lithography alignment marks

KLA Corporation

US 2026/0319389 A1Published 15 Oct 2026

Measuring method, shaping method, article manufacturing method, measuring apparatus, and shaping apparatus

Canon Kabushiki Kaisha

US 2026/0319388 A1Published 15 Oct 2026

Connection of a holding element to an optical element via a connecting material

Rusbeh GOECKE, Hansjochen KOECKERT +1inventors

US 2026/0319387 A1Published 15 Oct 2026

Positioning apparatus, lithography apparatus, and article manufacturing method

Canon Kabushiki Kaisha

US 2026/0319386 A1Published 15 Oct 2026

Substrate support member, substrate stage mechanism, lithography apparatus, and article manufacturing method

Takato Yuasa, Kazunori Nakajima +1inventors

US 2026/0319384 A1Published 15 Oct 2026

Method for operating a detection system of a metrology device and associated metrology device

ASML Netherlands B.V.

US 2026/0319383 A1Published 15 Oct 2026

Method and system for predicting after-development stochastic effects for full chip applications

ASML Netherlands B.V.

US 2026/0319382 A1Published 15 Oct 2026

Intensity order difference based metrology system, lithographic apparatus, and methods thereof

ASML Netherlands B.V.

US 2026/0319381 A1Published 15 Oct 2026

Method of predicting a response of an electromagnetic system to illumination electromagnetic radiation

ASML Netherlands B.V.

US 2026/0319380 A1Published 15 Oct 2026

Method for adjusting at least one sensor for a projection exposure apparatus and projection exposure apparatus

Ulfert WIESENDAHL, Marcel TESCHKE +1inventors

US 2026/0319379 A1Published 15 Oct 2026

Control method and non-transitory computer-readable storage medium storing a program for exposure apparatus

Canon Kabushiki Kaisha

US 2026/0319378 A1Published 15 Oct 2026

Adjusting effective depth of focus

Applied Materials, Inc.

US 2026/0319377 A1Published 15 Oct 2026

Systems, Methods, And Devices For Coherence Control In Microscopes

Euv Tech, Inc.

US 2026/0319376 A1Published 15 Oct 2026

Systems, Methods, And Devices For Full-Sized Pellicle Imaging

Euv Tech, Inc.

US 2026/0319375 A1Published 15 Oct 2026

Two-Color Projection Lithography with Wavevector-Filtered Deactivation Imaging

Enterprise Science Fund, LLC

US 2026/0319374 A1Published 15 Oct 2026

Two-Color Projection Lithography with Wavevector-Filtered Deactivation Imaging and Pupil-Plane Beam Shaping

Enterprise Science Fund, LLC

US 2026/0319373 A1Published 15 Oct 2026

Systems, Methods, And Devices For Spectrometers Associated With Microscopes

Euv Tech, Inc.

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