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US 2026/0227718 A1Published application
Topology optimized alignment marks
AssigneeASML Netherlands B.V.
InventorsSaman JAHANI, Roxana REZVANI NARAGHI, Nikhil MEHTA
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Abstract
Disclosed is a method for an inverse design method for topology optimized alignment marks. A first alignment mark to be used on a substrate is produced, such that the first alignment mark has a topology of at least two pixels with different properties. One or more properties of each of the at least two pixels is determined. The topology of the first alignment mark is optimized based on the one or more properties of the at least two pixels. A second alignment mark, based on optimizing the first alignment mark, is formed on the substrate.
Claims15
A method comprising:
- producing a first alignment mark to be used on a substrate, the first alignment mark comprising a topology of at least two pixels having different properties;
- determining one or more properties of each of the at least two pixels;
- optimizing the topology of the first alignment mark based on the one or more properties of the at least two pixels;
- and
- forming a second alignment mark, based on optimizing the first alignment mark, on the substrate.
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