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US 2026/0287787 A1Published application
Scalable nanoimprint manufacturing of functional multi-layer metasurface devices
AssigneeArizona Board of Regents on behalf of Arizona State University
InventorsChao WANG, Yu YAO, Shinhyuk CHOI, Jiawei ZUO
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Abstract
A polarimetric metastructure is disclosed that includes a metasurface structure, one or more vertically coupled double-layer metallic gratings, and a dielectric spacer layer between the metasurface structure and the vertically coupled double-layer metallic gratings.
Claims20
A method of alignment of two sets of gratings of slightly different periods (P1 and P2) that are designed in a metasurface and a vertically coupled double-layer metallic gratings (VCDG) structure, the method comprising:
- during a nanoimprint lithography process, arranging a substrate and a mold to a distance that is less than 10 μm where Moiré fringes are formed under white light illumination due to interference of two sets of gratings.
A method comprising:
- providing a mold comprising a first set of gratings having a first period;
- providing a substrate comprising a second set of gratings having a second period that is different from the first period;
- aligning the mold and the substrate to a distance that is less than 10 μm where Moiré fringes are formed under white light illumination due to interference produced by the first set of gratings and the second set of gratings;
- and
- imprinting the mold and the substrate after aligning to produce an optical metasurface and a vertically coupled double-layer metallic gratings (VCDG) structure.
2 more elements
Dependencies are inferred from the claim text.