G03F 9/7076
Mark details
Official title: {Mark details, e.g. phase grating mark, temporary mark}
G03F9/7076 (Mark details) appears on 797 US grants and 703 published applications in this corpus.
Search patents in G03F- Granted patents
- 797
- Published applications
- 703
- Assignees
- 234
- Inventors
- 1,521
- Latest grant
- 22 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 1 | 0 |
| 1978 | 2 | 0 |
| 1979 | 0 | 0 |
| 1980 | 1 | 0 |
| 1981 | 1 | 0 |
| 1982 | 9 | 0 |
| 1983 | 10 | 0 |
| 1984 | 2 | 0 |
| 1985 | 6 | 0 |
| 1986 | 13 | 0 |
| 1987 | 13 | 0 |
| 1988 | 6 | 0 |
| 1989 | 14 | 0 |
| 1990 | 5 | 0 |
| 1991 | 6 | 0 |
| 1992 | 6 | 0 |
| 1993 | 9 | 0 |
| 1994 | 5 | 0 |
| 1995 | 3 | 0 |
| 1996 | 9 | 0 |
| 1997 | 4 | 0 |
| 1998 | 8 | 0 |
| 1999 | 5 | 0 |
| 2000 | 12 | 0 |
| 2001 | 16 | 14 |
| 2002 | 14 | 29 |
| 2003 | 36 | 28 |
| 2004 | 20 | 31 |
| 2005 | 34 | 62 |
| 2006 | 31 | 49 |
| 2007 | 44 | 65 |
| 2008 | 43 | 40 |
| 2009 | 32 | 46 |
| 2010 | 29 | 24 |
| 2011 | 42 | 36 |
| 2012 | 37 | 19 |
| 2013 | 29 | 13 |
| 2014 | 26 | 13 |
| 2015 | 12 | 20 |
| 2016 | 16 | 6 |
| 2017 | 14 | 14 |
| 2018 | 8 | 11 |
| 2019 | 19 | 31 |
| 2020 | 29 | 29 |
| 2021 | 25 | 23 |
| 2022 | 23 | 29 |
| 2023 | 18 | 24 |
| 2024 | 17 | 15 |
| 2025 | 16 | 17 |
| 2026 | 16 | 15 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Alignment method based on holographic lithography, system and device22 Sep 2026US 12,743,036 B2Hyper-Optics (Beijing) Technologies Ltd.
- Alignment mark and imprinting method15 Sep 2026US 12,740,434 B2Kioxia Corporation
- Mask plate, alignment mark and photolithography system4 Aug 2026US 12,699,333 B2Semiconductor Manufacturing International (Beijing) Corporation
- Multiple targets on substrate layers for layer alignment21 Jul 2026US 12,687,793 B2Intel Corporation
- Methods to process 3D semiconductor devices and structures which have metal layers16 Jun 2026US 12,660,326 B2Monolithic 3D Inc.
- Scalable nanoimprint manufacturing of functional multi-layer metasurface devices24 Sep 2026US 2026/0287787 A1Arizona Board of Regents on behalf of Arizona State University
- Semiconductor substrate having a hybrid alignment structure3 Sep 2026US 2026/0259508 A1Infineon Technologies AG
- Semiconductor device having alignment mark27 Aug 2026US 2026/0251989 A1Micron Technology, Inc.
- Topology optimized alignment marks6 Aug 2026US 2026/0227718 A1ASML Netherlands B. V.
- Lithographic apparatus and inspection system for measuring wafer deformation16 Jul 2026US 2026/0202191 A1ASML Netherlands B. V.
Most cited
By later US patents
- Lithographic apparatus, device manufacturing method, and device manufactured thereby234US 6,961,116 B2ASML Netherlands B. V. · 2005
- Method and apparatus for the alignment of a substrate167US 5,493,403 ANikon Corporation · 1996
- Stamp for a lithographic process159US 5,817,242 AInternational Business Machines.Corp · 1998
- Semiconductor integrated circuit device, and fabrication process and designing method thereof134US 6,261,883 B1Hitachi, Ltd. · 2001
- Projection scanning exposure apparatus with synchronous mask/wafer alignment system122US 5,506,684 ANikon Corporation · 1996