Projection scanning exposure apparatus with synchronous mask/wafer alignment system

An apparatus which transfers an original pattern formed on a first substrate to a predetermined area on a second substrate, wherein said first substrate is provided with a first mark formed over substantially the entire range of a forming area of said original pattern along a predetermined direction and said second substrate is provided with a second mark formed over substantially the entire range of said predetermined area along said predetermined direction, said apparatus comprising:

• a measuring device for measuring an amount of relative positional displacement between said first and second marks in said predetermined direction;
• a first drive system for moving one of said first and second substrates at a constant speed in said predetermined direction during transfer of said original pattern to said predetermined area;
• and
• a second drive system for moving the other of said first and second substrates in said predetermined direction dependent on an amount of a positional displacement detected by said measuring device during movement of said one substrate.

An apparatus which transfers an original pattern formed on a mask to a predetermined area on a photosensitive substrate while moving said mask and said photosensitive substrate in synchronism with each other, comprising:

• a projection optical system which projects at least a portion of said original pattern on said photosensitive substrate;
• a mask stage supporting said mask and movable in a predetermined direction perpendicular to an optical axis of said projection optical system;
• a substrate stage supporting said photosensitive substrate and movable in said predetermined direction;
• wherein said mask is provided with first and second mask marks formed on opposite sides of said original pattern over substantially the entire range of a forming area of said original pattern along said predetermined direction, and said photosensitive substrate is provided with first and second substrate marks formed on opposite sides of said predetermined area over substantially the entire range of said predetermined area along said predetermined directions;
• a measuring device for measuring an amount of relative positional displacement between each of said first and second mask marks and each of said first and second substrate marks corresponding to each of said mask marks in said predetermined direction;
• a first drive system driving one of said mask stage and said substrate stage at a predetermined set speed in said predetermined direction during transfer of said original pattern to said predetermined area;
• a second drive system driving the other of said mask stage and said substrate stage in said predetermined direction in such a manner that an amount of positional displacement detected by said measuring device accompanying movement of said one stage is kept at a predetermined value;
• and
• a rotation device for relatively rotating said mask and said photosensitive substrate on the basis of an amount of positional displacement detected by said measuring device.

An apparatus which transfers an original pattern formed on a mask to a predetermined area on a photosensitive substrate while moving said mask and said photosensitive substrate in synchronism with each other, comprising:

• a projection optical system projecting at least a portion of said original pattern on said photosensitive substrate;
• a mask stage supporting said mask and movable in a first direction perpendicular to an optical axis of said projection optical system;
• a substrate stage supporting said photosensitive substrate and movable in said first direction;
• wherein said mask is provided with a first mask grating consisting of plural grating elements arranged in said first direction and a second mask grating consisting of plural grating elements arranged in a second direction perpendicular to said first direction, each mask grating extending over substantially the entire range of a forming area of said original pattern, and said photosensitive substrate is provided with a first substrate grating consisting of plural grating elements arranged in said first direction and a second substrate grating consisting of plural grating elements arranged in said second direction, each substrate grating extending over substantially the entire range of said predetermined area;
• a measuring device measuring a first amount of positional displacement between said first mask grating and said first substrate grating in said first direction and measuring a second amount of positional displacement between said second mask grating and said second substrate grating in said second direction;
• a first drive system for driving one of said mask stage and said substrate stage at a predetermined set speed in said first direction during transfer of said original pattern to said predetermined area;
• a second drive system for driving the other of said mask stage and said substrate stage in said first direction in such a manner that said first amount of positional displacement detected by said measuring device accompanying movement of said one stage is kept at a predetermined value;
• and
• a third drive system for relatively moving said mask and said photosensitive substrate in said second direction in such a manner that said second amount of positional displacement detected by said measuring device is kept at a predetermined value.

An apparatus which transfers an original pattern formed on a mask to a predetermined area on a photosensitive substrate while moving said mask and said photosensitive substrate in synchronism with each other, comprising:

• a projection optical system for projecting at least a portion of said original pattern on said photosensitive substrate;
• a mask stage supporting said mask and movable in a predetermined direction perpendicular to an optical axis of said projection optical system;
• a substrate stage supporting said photosensitive substrate and movable in said predetermined direction;
• a drive device for driving said mask stage and said substrate stage in synchronism with each other;
• wherein said mask is provided with a mask grating consisting of plural grating elements arranged in said predetermined direction over substantially the entire range of a forming area of said original pattern, and said photosensitive substrate is provided with a substrate grating consisting of plural grating elements arranged in said predetermined direction over substantially the entire area of said predetermined area;
• a measuring device for measuring an amount of positional displacement between said mask grating and said substrate grating in said predetermined direction, the measuring device including a light irradiation system which radiates two beams having a predetermined frequency difference on each of said mask grating and said substrate grating, and a photodetector which receives diffracted light produced from said mask grating and diffracted light produced from said substrate grating;
• and
• a regulator which changes frequency of at least one of said two beams according to a drive condition of said substrate stage and said mask stage when said original pattern is transferred to said predetermined area.

An apparatus for transferring an original pattern formed on a mask, onto a predetermined area on a photosensitive substrate, comprising:

• a projection optical system for projecting at least a part of said original pattern onto said photosensitive substrate;
• a mask stage carrying thereon said mask and being movable in a predetermined direction perpendicular to the axis of said projection optical system;
• a movable member for moving said mask, relative to the mask stage;
• a substrate stage for holding said photosensitive substrate so as to move the same in said predetermined direction;
• a first system for driving said mask stage and said substrate stage with a speed ratio in dependence upon a magnification of projection of said projection optical system;
• wherein said mask has a mask mark formed over a substantially entire range of an area where said original pattern is formed, along said predetermined direction, and said photosensitive substrate has a substrate mark formed over a substantially entire range of said predetermined area along said predetermined direction;
• a measuring device for measuring a relative positional deviation between said mask mark and said substrate mark;
• and
• a second system for driving said movable member so as to maintain said relative positional deviation measured by said measuring device at a predetermined value while said mask stage and said substrate stage are driven.

An apparatus for transferring an original pattern formed on a first substrate onto a predetermined area on a second substrate, comprising:

• a projection optical system for projecting at least a part of said original pattern onto said second substrate;
• a driving system for moving said first substrate and said second substrate along said predetermined direction with a speed ratio in dependence upon a magnification of projection of said projection optical system;
• a movable member for changing relative positional relationship between said first and second substrates, irrespective of movement by said drive system;
• wherein said first substrate has a first mask mark formed over a substantially entire range of an area where said original pattern is formed, along said predetermined direction, and said second substrate has a second mark formed over a substantially entire range of said predetermined area along said predetermined direction;
• a measuring device for measuring a relative positional deviation between said first and second marks;
• and
• a controller for controlling movement of said movable member so as to maintain said positional deviation measured by said measuring device at a predetermined value while said first and second substrates are moved.

An apparatus for transferring an original pattern formed on a mask, onto a predetermined area on a photosensitive substrate, comprising:

• a projection optical system for projecting at least a part of said original pattern onto said photosensitive substrate;
• a mask stage carrying thereon said mask and being movable in a predetermined direction perpendicular to the axis of said optical system;
• a substrate stage for holding said photosensitive substrate, which is movable in said predetermined direction;
• wherein said mask has mask marks which are incorporated respectively to a plurality of partial patterns constituting said original pattern and arranged in said predetermined direction, and said photosensitive substrate has substrate marks which are incorporated respectively to a plurality of partial areas constituting the said predetermined area and arranged in said predetermined direction;
• a device for measuring a relative positional deviation between a mask mark incorporated to one of said plurality of partial patterns and a substrate mark incorporated to one of said plurality of partial areas, onto which said one of partial patterns is transferred;
• and
• a movable member for moving said mask and said photosensitive substrate, relative to each other, so as to maintain the positional deviation measured by said measuring device at a predetermined value, when said mask stage and said substrate stage are successively moved in order to transfer said original pattern onto said predetermined area.

A scanning exposure apparatus comprising:

• a measuring system for measuring a positional deviation between a mask and a substrate in a predetermined direction;
• a first driving system for moving one of said mask and said substrate at a constant speed in said predetermined direction during scanning exposure;
• and
• a second driving system for moving the other of said mask and said substrate in said predetermined direction dependent on a positional deviation detected by said measuring system during said scanning exposure.