G03F 9/7092
Signal processing
Official title: {Signal processing}
G03F9/7092 (Signal processing) appears on 257 US grants and 303 published applications in this corpus.
Search patents in G03F- Granted patents
- 257
- Published applications
- 303
- Assignees
- 56
- Inventors
- 571
- Latest grant
- 22 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1981 | 1 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 1 | 0 |
| 1988 | 1 | 0 |
| 1989 | 0 | 0 |
| 1990 | 1 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 2 | 0 |
| 1996 | 2 | 0 |
| 1997 | 2 | 0 |
| 1998 | 1 | 0 |
| 1999 | 6 | 0 |
| 2000 | 6 | 0 |
| 2001 | 3 | 5 |
| 2002 | 4 | 6 |
| 2003 | 9 | 11 |
| 2004 | 7 | 13 |
| 2005 | 9 | 15 |
| 2006 | 12 | 21 |
| 2007 | 8 | 15 |
| 2008 | 11 | 12 |
| 2009 | 11 | 11 |
| 2010 | 7 | 11 |
| 2011 | 8 | 3 |
| 2012 | 3 | 3 |
| 2013 | 6 | 5 |
| 2014 | 5 | 3 |
| 2015 | 7 | 7 |
| 2016 | 1 | 8 |
| 2017 | 8 | 5 |
| 2018 | 9 | 11 |
| 2019 | 16 | 17 |
| 2020 | 11 | 17 |
| 2021 | 13 | 8 |
| 2022 | 16 | 17 |
| 2023 | 11 | 20 |
| 2024 | 15 | 18 |
| 2025 | 13 | 18 |
| 2026 | 11 | 23 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Height measurement sensor using derivative of periodic points22 Sep 2026US 12,742,636 B2ASML Netherlands B. V.
- Method for determining a focus actuation profile for one or more actuators of a lithographic exposure apparatus22 Sep 2026US 12,743,034 B2ASML Netherlands B. V.
- Alignment method based on holographic lithography, system and device22 Sep 2026US 12,743,036 B2Hyper-Optics (Beijing) Technologies Ltd.
- Measurement apparatus, measurement method, lithography apparatus and article manufacturing method18 Aug 2026US 12,710,263 B2Canon Kabushiki Kaisha
- Position measuring method, method for manufacturing article, position measuring apparatus, semiconductor manufacturing apparatus, and imprint apparatus21 Apr 2026US 12,607,945 B2Canon Kabushiki Kaisha
- Nanoimprint lithography mold and nanoimprint lithography using same8 Oct 2026US 2026/0310109 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Scalable nanoimprint manufacturing of functional multi-layer metasurface devices24 Sep 2026US 2026/0287787 A1Arizona Board of Regents on behalf of Arizona State University
- Mark position measurement apparatus and mark position measurement method10 Sep 2026US 2026/0266592 A1NuFlare Technology, Inc.
- Detection apparatus, detection method, storage medium, lithography apparatus, and article manufacturing method20 Aug 2026US 2026/0245245 A1Canon Kabushiki Kaisha
- Adjustment method, imprint method, article manufacturing method, and imprint apparatus13 Aug 2026US 2026/0233440 A1Canon Kabushiki Kaisha
Most cited
By later US patents
- Position measurement apparatus and method and pattern forming apparatus and writing method551US 7,640,142 B2NuFlare Technology, Inc. · 2009
- Method and apparatus for the alignment of a substrate167US 5,493,403 ANikon Corporation · 1996
- Aligning method utilizing reliability weighting coefficients62US 5,543,921 ACanon Kabushiki Kaisha · 1996
- Systems, methods and computer program products for detecting the position of a new alignment mark on a substrate based on fitting to sample alignment signals45US 6,064,486 ALeland Stanford Junior University · 2000
- Method and apparatus for detecting the position of a substrate having first and second patterns of different sizes43US 5,418,613 ACanon Kabushiki Kaisha · 1995