G03F 9/7065
Production of alignment light
Official title: {Production of alignment light, e.g. light source, control of coherence, polarization, pulse length, wavelength}
G03F9/7065 (Production of alignment light) appears on 236 US grants and 217 published applications in this corpus.
Search patents in G03F- Granted patents
- 236
- Published applications
- 217
- Assignees
- 69
- Inventors
- 439
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 0 | 0 |
| 1978 | 0 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 1 | 0 |
| 1982 | 1 | 0 |
| 1983 | 3 | 0 |
| 1984 | 0 | 0 |
| 1985 | 1 | 0 |
| 1986 | 3 | 0 |
| 1987 | 10 | 0 |
| 1988 | 4 | 0 |
| 1989 | 5 | 0 |
| 1990 | 4 | 0 |
| 1991 | 5 | 0 |
| 1992 | 3 | 0 |
| 1993 | 2 | 0 |
| 1994 | 1 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 4 | 0 |
| 1998 | 1 | 0 |
| 1999 | 2 | 0 |
| 2000 | 6 | 0 |
| 2001 | 4 | 0 |
| 2002 | 4 | 5 |
| 2003 | 2 | 4 |
| 2004 | 4 | 2 |
| 2005 | 3 | 13 |
| 2006 | 11 | 11 |
| 2007 | 7 | 7 |
| 2008 | 5 | 7 |
| 2009 | 7 | 11 |
| 2010 | 4 | 10 |
| 2011 | 6 | 6 |
| 2012 | 8 | 3 |
| 2013 | 3 | 6 |
| 2014 | 9 | 3 |
| 2015 | 2 | 6 |
| 2016 | 5 | 1 |
| 2017 | 4 | 7 |
| 2018 | 7 | 6 |
| 2019 | 5 | 15 |
| 2020 | 15 | 11 |
| 2021 | 12 | 17 |
| 2022 | 13 | 15 |
| 2023 | 14 | 8 |
| 2024 | 5 | 18 |
| 2025 | 14 | 11 |
| 2026 | 6 | 14 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Intensity measurements using off-axis illumination6 Oct 2026US 12,754,488 B2ASML Netherlands B. V.
- Imprint apparatus, imprint method, and article manufacturing method16 Jun 2026US 12,654,387 B2Canon Kabushiki Kaisha
- Systems and methods for generating multiple illumination spots from a single illumination source16 Jun 2026US 12,656,698 B2ASML Netherlands B. V.
- Projection unit for a level sensor, method of monitoring height of a substrate, and lithographic system comprising the projection unit5 May 2026US 12,619,170 B2ASML Netherlands B. V.
- Scalable nanoimprint manufacturing of functional multi-layer metasurface devices24 Mar 2026US 12,585,043 B2Arizona Board of Regents on behalf of Arizona State University
- Scalable nanoimprint manufacturing of functional multi-layer metasurface devices24 Sep 2026US 2026/0287787 A1Arizona Board of Regents on behalf of Arizona State University
- Mark position measurement apparatus and mark position measurement method10 Sep 2026US 2026/0266592 A1NuFlare Technology, Inc.
- Systems and methods for generating multiple illumination spots from a single illumination source13 Aug 2026US 2026/0235971 A1ASML Netherlands B. V.
- Lithographic apparatus, inspection system, and method of implementing parallel sensor-heads with a common radiation source30 Jul 2026US 2026/0219593 A1ASML Netherlands B. V.
- Enabling more marks in alignment sensor23 Jul 2026US 2026/0211343 A1ASML Netherlands B. V.
Most cited
By later US patents
- Position-detection method and apparatus with a grating mark134US 5,801,390 ANikon Corporation · 1998
- Alignment apparatus in projection exposure apparatus111US 6,153,886 ANikon Corporation · 2000
- Position detection apparatus91US 4,710,026 ANippon Kogaku K. K. · 1987
- Promixity alignment using polarized illumination and double conjugate projection lens87US 5,072,126 AInternational Business Machines Corporation · 1991
- Measuring an alignment target with a single polarization state87US 6,992,764 B1Nanometrics Incorporated · 2006