Imprint apparatus, imprint method, and article manufacturing method
AssigneeCanon Kabushiki Kaisha
InventorFumiaki Kitayama
Life of this patent
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Abstract
An imprint apparatus that forms a pattern of a curable composition on a substrate by using a mold, includes an alignment mechanism configured to perform alignment between a shot region of the substrate and a pattern region of the mold, a curing device configured to cure the curable composition between the shot region and the pattern region by irradiating the curable composition with light, and a controller configured to change control information of the alignment by the alignment mechanism in accordance with a change of an irradiation condition of light by the curing device.
Claims20
An imprint apparatus that forms a pattern of a curable composition on a substrate by using a mold, comprising:
- an alignment mechanism configured to perform alignment between a shot region of the substrate and a pattern region of the mold;
- a curing device configured to cure the curable composition between the shot region and the pattern region by irradiating the curable composition with light;
- and
- a controller configured to change control information of the alignment by the alignment mechanism in accordance with a change of an irradiation condition of light by the curing device.
An imprint method that comprises performing alignment between a shot region of a substrate and a pattern region of a mold, and curing a curable composition between the shot region and the pattern region by irradiating the curable composition with light after the performing alignment, the method comprising
- changing control information for controlling the alignment in the performing alignment in accordance with a change of an irradiation condition of light in the curing.
Dependencies are inferred from the claim text.