Back to results
US 12,585,043 B2Granted
Scalable nanoimprint manufacturing of functional multi-layer metasurface devices
AssigneeArizona Board of Regents on behalf of Arizona State University
InventorsChao Wang, Yu Yao, Shinhyuk Choi, Jiawei Zuo
Life of this patent
Estimating the term…
Abstract
A polarimetric metastructure is disclosed that includes a metasurface structure, one or more vertically coupled double-layer metallic gratings, and a dielectric spacer layer between the metasurface structure and the vertically coupled double-layer metallic gratings.
Claims2
A method of fabricating polarimetric metastructures, the method comprising:
- performing a first nanoimprint lithography step to produce metasurface structures;
- determining structural parameters of vertically coupled double-layer metallic gratings, wherein the structural parameters comprise a grating period (p), a grating height (h), a metal thickness (t), and a gap (g) for targeted polarimetric performance;
- determining a dielectric spacer thickness (d);
- performing a second nanoimprint lithography step to create a scaffold of the vertically coupled double-layer metallic gratings on top of a fabricated metasurface structure;
- and
- depositing metal on vertically coupled double-layer metallic gratings resist polymer with a designed thickness (t).
3 more elements
Dependencies are inferred from the claim text.