G03F 9/7069
Alignment mark illumination
Official title: {Alignment mark illumination, e.g. darkfield, dual focus}
G03F9/7069 (Alignment mark illumination) appears on 154 US grants and 144 published applications in this corpus.
Search patents in G03F- Granted patents
- 154
- Published applications
- 144
- Assignees
- 49
- Inventors
- 297
- Latest grant
- 8 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1980 | 1 | 0 |
| 1981 | 2 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 1 | 0 |
| 1985 | 2 | 0 |
| 1986 | 4 | 0 |
| 1987 | 8 | 0 |
| 1988 | 2 | 0 |
| 1989 | 4 | 0 |
| 1990 | 0 | 0 |
| 1991 | 2 | 0 |
| 1992 | 0 | 0 |
| 1993 | 2 | 0 |
| 1994 | 2 | 0 |
| 1995 | 1 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 3 | 0 |
| 1999 | 0 | 0 |
| 2000 | 3 | 0 |
| 2001 | 2 | 0 |
| 2002 | 2 | 2 |
| 2003 | 3 | 5 |
| 2004 | 2 | 2 |
| 2005 | 7 | 5 |
| 2006 | 5 | 5 |
| 2007 | 1 | 7 |
| 2008 | 0 | 2 |
| 2009 | 4 | 4 |
| 2010 | 2 | 3 |
| 2011 | 1 | 1 |
| 2012 | 3 | 6 |
| 2013 | 1 | 5 |
| 2014 | 3 | 4 |
| 2015 | 6 | 10 |
| 2016 | 9 | 4 |
| 2017 | 7 | 7 |
| 2018 | 9 | 6 |
| 2019 | 7 | 7 |
| 2020 | 7 | 11 |
| 2021 | 8 | 2 |
| 2022 | 5 | 7 |
| 2023 | 7 | 8 |
| 2024 | 5 | 9 |
| 2025 | 7 | 10 |
| 2026 | 4 | 12 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Metrology method and apparatus8 Sep 2026US 12,730,388 B2ASML Netherlands B. V.
- Imprint apparatus, imprint method, and article manufacturing method16 Jun 2026US 12,654,387 B2Canon Kabushiki Kaisha
- Systems and methods for generating multiple illumination spots from a single illumination source16 Jun 2026US 12,656,698 B2ASML Netherlands B. V.
- Lithographic pre-alignment imaging sensor with build-in coaxial illumination13 Jan 2026US 12,523,941 B2ASML Holding N. V.
- On chip wafer alignment sensor2 Dec 2025US 12,487,081 B2ASML Holding N. V.
- Illumination apparatus, measurement apparatus, substrate processing apparatus, and method for manufacturing article1 Oct 2026US 2026/0299436 A1Canon Kabushiki Kaisha
- Mark detection method, mark detection apparatus, pattern formation apparatus, and article manufacturing method1 Oct 2026US 2026/0305247 A1Canon Kabushiki Kaisha
- Systems and methods for generating multiple illumination spots from a single illumination source13 Aug 2026US 2026/0235971 A1ASML Netherlands B. V.
- Enabling more marks in alignment sensor23 Jul 2026US 2026/0211343 A1ASML Netherlands B. V.
- Semiconductor lithography apparatus for measuring and/or registering structures and methods for measuring and/or registering structures23 Jul 2026US 2026/0211344 A1
Most cited
By later US patents
- Projection exposure apparatus109US 4,814,829 ACanon Kabushiki Kaisha · 1989
- Method and apparatus for transfer of a reticle pattern onto a substrate by scanning103US 5,298,939 A1994
- Promixity alignment using polarized illumination and double conjugate projection lens87US 5,072,126 AInternational Business Machines Corporation · 1991
- Alignment device and lithographic apparatus comprising such a device70US 6,160,622 AASM Lithography B.V. · 2000
- System and method for dark field inspection65US 9,134,633 B2Taiwan Semiconductor Manufacturing Company.Ltd · 2015