Mark detection method, mark detection apparatus, pattern formation apparatus, and article manufacturing method

A mark detection apparatus configured to detect a substrate mark formed on a substrate and a mold mark formed on a mold, in a case that a pattern is formed using the mold on an imprint material supplied onto the substrate, the mark detection apparatus comprising:

• an adjustment unit configured to adjust an illumination condition for mark detection by using the substrate mark and the mold mark;
• a supply unit configured to supply the imprint material onto the substrate after the illumination condition is adjusted by the adjustment unit;
• a detection unit configured to detect the substrate mark and the mold mark illuminated based on the illumination condition, after the imprint material is supplied;
• and
• a control unit configured to obtain a first relative position between the substrate mark and the mold mark detected by the detection unit, and control an alignment between the substrate and the mold based on the first relative position,
• wherein the substrate mark and the mold mark used for adjusting the illumination condition are identical to the substrate mark and the mold mark detected when the first relative position is obtained.

A pattern formation apparatus configured to align the substrate and the mold, the apparatus comprising;

• an illumination system configured to adjust an illumination condition for mark detection by using a substrate mark formed on the substrate and a mold mark formed on the mold;
• a dispenser configured to supply the imprint material onto the substrate after the illumination condition is adjusted by the adjustment unit;
• a scope configured to detect the substrate mark and the mold mark illuminated based on the illumination condition, after the imprint material is supplied;
• and
• at least one processor or circuit configured to function as:
• a control unit configured to obtain a first relative position between the substrate mark and the mold mark detected by the detection unit, and control an alignment between the substrate and the mold based on the first relative position,
• wherein the substrate mark and the mold mark used for adjusting the illumination condition are identical to the substrate mark and the mold mark detected when the first relative position is obtained.

An article manufacturing method, comprising:

• adjusting, as an adjustment process, an illumination condition for mark detection by using a substrate mark formed on a substrate and a mold mark formed on a mold;
• supplying, as a supply process, an imprint material onto the substrate after the adjustment process;
• measuring, as a first measurement process, a first relative position between the substrate mark and the mold mark by detecting the substrate mark and the mold mark based on the illumination condition after the supply process;
• aligning, as an alignment process, the substrate and the mold based on the first relative position;
• forming a pattern on the substrate, as a formation process;
• and
• processing the substrate with the pattern formed thereon to manufacture an article,
• wherein the substrate mark and the mold mark used in the adjustment process are identical to the substrate mark and the mold mark detected in the first measurement process.