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US 5,298,939 AGranted
Method and apparatus for transfer of a reticle pattern onto a substrate by scanning
OwnerPaul A. Swanson, John A. Gibson +1inventors
InventorsPaul A. Swanson, John A. Gibson, Jeffrey G. Knirck
Life of this patent
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Abstract
A system and method for transferring a reticle (201) pattern to a substrate image (203) by scanning. The reticle is placed between an illumination system (118) and the projection lens (117). The substrate is located below the projection lens. A loading system, wafer adjustment system, and focusing system are also disclosed.
Claims16
A photolithographic system comprising:
- an illumination section;
- a reticle mount adjacent the illumination section for holding a reticle comprising a pattern for fabrication of the electronic devices;
- a unity magnification optical relay system having at least two optical elements for forming an erect and non-reversed image for imaging the reticle onto a substrate, the reticle mount located between the illumination section and the optical relay system;
- a substrate mount for holding the substrate on the opposite side of the optical relay system relative to and substantially parallel to the reticle mount during the photolithographic process;
- means for substantially locking the reticle mount and the substrate mount together during the entire photolithographic process;
- and
- means for providing relative motion of the interlocked reticle and substrate mounts with respect to the optical relay and illumination systems in multiple, adjacent, partially overlapping scans.
4 more elements
A photolithographic system for manufacturing electronic devices comprising:
- an illumination section;
- a reticle mount adjacent said illumination section for holding a reticle in a substantially vertical orientation, comprising a pattern for fabrication of said electronic devices;
- a unity magnification imaging lens system for imaging said reticle onto a substrate, said reticle mount located between said illumination section and said imaging lens system, said imaging lens system comprising:
- a first optical relay comprising first and second prisms projecting trapezoidal images, said first prism receiving said pattern from said reticle and transmitting said pattern through a first series of lenses to a first mirror, and said second prism receiving said pattern from said first mirror through said first series of lenses;
- and
- a second optical relay comprising third and fourth prisms projecting trapezoidal images, said third prism receiving said pattern from said second prism and transmitting said pattern through a second series of lenses to a second mirror, and said fourth prism receiving said pattern from said second mirror through said second series of lenses and transmitting said pattern to said substrate, said prisms presenting an upright image on said substrate;
- means for holding said substrate in a substantially vertical, fixed position relative to said reticle mount during lithographic operations, said means for holding being located adjacent said unity magnification imaging lens system opposite said reticle mount, said means for holding being movable independently of said reticle mount;
- and
- means for moving said reticle mount and said means for holding said substrate together, relative to said lens and illumination systems.
6 more elements
Dependencies are inferred from the claim text.