G03F 9/7049
Technique
Official title: {Technique, e.g. interferometric}
G03F9/7049 (Technique) appears on 695 US grants and 500 published applications in this corpus.
Search patents in G03F- Granted patents
- 695
- Published applications
- 500
- Assignees
- 141
- Inventors
- 1,059
- Latest grant
- 22 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 4 | 0 |
| 1978 | 3 | 0 |
| 1979 | 2 | 0 |
| 1980 | 6 | 0 |
| 1981 | 3 | 0 |
| 1982 | 7 | 0 |
| 1983 | 11 | 0 |
| 1984 | 6 | 0 |
| 1985 | 19 | 0 |
| 1986 | 14 | 0 |
| 1987 | 19 | 0 |
| 1988 | 12 | 0 |
| 1989 | 17 | 0 |
| 1990 | 13 | 0 |
| 1991 | 14 | 0 |
| 1992 | 22 | 0 |
| 1993 | 19 | 0 |
| 1994 | 13 | 0 |
| 1995 | 12 | 0 |
| 1996 | 15 | 0 |
| 1997 | 8 | 0 |
| 1998 | 7 | 0 |
| 1999 | 2 | 0 |
| 2000 | 8 | 0 |
| 2001 | 10 | 9 |
| 2002 | 6 | 16 |
| 2003 | 20 | 17 |
| 2004 | 12 | 28 |
| 2005 | 19 | 29 |
| 2006 | 17 | 37 |
| 2007 | 25 | 17 |
| 2008 | 25 | 24 |
| 2009 | 23 | 35 |
| 2010 | 13 | 26 |
| 2011 | 21 | 29 |
| 2012 | 23 | 13 |
| 2013 | 21 | 19 |
| 2014 | 17 | 16 |
| 2015 | 17 | 16 |
| 2016 | 14 | 6 |
| 2017 | 21 | 16 |
| 2018 | 14 | 18 |
| 2019 | 26 | 33 |
| 2020 | 23 | 20 |
| 2021 | 19 | 11 |
| 2022 | 16 | 15 |
| 2023 | 13 | 13 |
| 2024 | 6 | 13 |
| 2025 | 10 | 10 |
| 2026 | 7 | 14 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Height measurement sensor using derivative of periodic points22 Sep 2026US 12,742,636 B2ASML Netherlands B. V.
- Alignment method based on holographic lithography, system and device22 Sep 2026US 12,743,036 B2Hyper-Optics (Beijing) Technologies Ltd.
- Grid plate encoder based positioning system and method1 Sep 2026US 12,724,038 B2Nearfield Instruments B.V.
- Gap detection system and method, and focal plane correction method4 Aug 2026US 12,699,332 B2The Institute of Optics and Electronics, The Chinese Academy of Sciences
- Detection device, lithography apparatus, and article manufacturing method7 Apr 2026US 12,596,310 B2Canon Kabushiki Kaisha
- Nanoimprint lithography mold and nanoimprint lithography using same8 Oct 2026US 2026/0310109 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Illumination apparatus, measurement apparatus, substrate processing apparatus, and method for manufacturing article1 Oct 2026US 2026/0299436 A1Canon Kabushiki Kaisha
- Mark position measurement apparatus and mark position measurement method10 Sep 2026US 2026/0266592 A1NuFlare Technology, Inc.
- Positioning apparatus, exposure apparatus, air sensor, and article manufacturing method27 Aug 2026US 2026/0251988 A1Canon Kabushiki Kaisha
- Enabling more marks in alignment sensor23 Jul 2026US 2026/0211343 A1ASML Netherlands B. V.
Most cited
By later US patents
- Nanoimprint lithography828US 5,772,905 ARegents of the University of Minnesota · 1998
- Signature filter system544US 4,944,036 A1990
- Release surfaces, particularly for use in nanoimprint lithography323US 6,309,580 B1Regents of the University of Minnesota · 2001
- Scanner system234US 4,672,457 A1987
- Lithographic apparatus, device manufacturing method, and device manufactured thereby234US 6,961,116 B2ASML Netherlands B. V. · 2005