G03F 9/7053
Non-optical
Official title: {Non-optical, e.g. mechanical, capacitive, using an electron beam, acoustic or thermal waves}
G03F9/7053 (Non-optical) appears on 143 US grants and 143 published applications in this corpus.
Search patents in G03F- Granted patents
- 143
- Published applications
- 143
- Assignees
- 62
- Inventors
- 326
- Latest grant
- 1 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1982 | 1 | 0 |
| 1983 | 1 | 0 |
| 1984 | 2 | 0 |
| 1985 | 5 | 0 |
| 1986 | 3 | 0 |
| 1987 | 5 | 0 |
| 1988 | 2 | 0 |
| 1989 | 0 | 0 |
| 1990 | 1 | 0 |
| 1991 | 1 | 0 |
| 1992 | 2 | 0 |
| 1993 | 0 | 0 |
| 1994 | 4 | 0 |
| 1995 | 0 | 0 |
| 1996 | 1 | 0 |
| 1997 | 1 | 0 |
| 1998 | 2 | 0 |
| 1999 | 0 | 0 |
| 2000 | 1 | 0 |
| 2001 | 5 | 1 |
| 2002 | 1 | 9 |
| 2003 | 6 | 8 |
| 2004 | 6 | 6 |
| 2005 | 2 | 6 |
| 2006 | 5 | 12 |
| 2007 | 1 | 6 |
| 2008 | 5 | 9 |
| 2009 | 8 | 7 |
| 2010 | 5 | 8 |
| 2011 | 8 | 12 |
| 2012 | 5 | 6 |
| 2013 | 6 | 5 |
| 2014 | 7 | 5 |
| 2015 | 3 | 3 |
| 2016 | 5 | 2 |
| 2017 | 2 | 2 |
| 2018 | 3 | 4 |
| 2019 | 4 | 10 |
| 2020 | 5 | 6 |
| 2021 | 8 | 3 |
| 2022 | 5 | 2 |
| 2023 | 2 | 2 |
| 2024 | 2 | 5 |
| 2025 | 1 | 1 |
| 2026 | 1 | 3 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Grid plate encoder based positioning system and method1 Sep 2026US 12,724,038 B2Nearfield Instruments B.V.
- Method and metrology tool for determining information about a target structure, and cantilever probe28 Jan 2025US 12,209,994 B2ASML Netherlands B. V.
- Method of wafer alignment using at resolution metrology on product features22 Oct 2024US 12,124,179 B2ASML Netherlands B. V.
- Apparatus and methods for determining the position of a target structure on a substrate12 Mar 2024US 11,927,891 B2ASML Netherlands B. V.
- Sensor apparatus for lithographic measurements19 Sep 2023US 11,761,929 B2ASML Netherlands B. V.
- Positioning apparatus, exposure apparatus, air sensor, and article manufacturing method27 Aug 2026US 2026/0251988 A1Canon Kabushiki Kaisha
- Height measurement device, exposure apparatus, and article manufacturing method16 Jul 2026US 2026/0202187 A1Canon Kabushiki Kaisha
- On tool metrology scheme for advanced packaging19 Feb 2026US 2026/0050227 A1APPLIED Materials.Inc.
- Determining a measurement recipe in a metrology method8 May 2025US 2025/0147429 A1ASML Netherlands B. V.
- First holding apparatus, third holding apparatus, fifth holding apparatus, transport system, exposure system, exposure method, and device manufacturing method14 Nov 2024US 2024/0377763 A1Nikon Corporation
Most cited
By later US patents
- Nanoimprint lithography828US 5,772,905 ARegents of the University of Minnesota · 1998
- Release surfaces, particularly for use in nanoimprint lithography323US 6,309,580 B1Regents of the University of Minnesota · 2001
- Method and apparatus for high density nanostructures222US 6,518,189 B1Regents of the University of Minnesota · 2003
- Lithographic apparatus, device manufacturing method, and device manufactured thereby128US 6,819,425 B2ASML Netherland B.V. · 2004
- Lithographic apparatus, device manufacturing method and device manufacturing thereby112US 7,289,212 B2ASML Netherlands B. V. · 2007