G03F 9/7057
Gas flow
Official title: {Gas flow, e.g. for focusing, leveling or gap setting}
G03F9/7057 (Gas flow) appears on 31 US grants and 24 published applications in this corpus.
Search patents in G03F- Granted patents
- 31
- Published applications
- 24
- Assignees
- 15
- Inventors
- 78
- Latest grant
- 5 Oct 2021
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1982 | 1 | 0 |
| 1983 | 0 | 0 |
| 1984 | 1 | 0 |
| 1985 | 2 | 0 |
| 1986 | 2 | 0 |
| 1987 | 2 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 1 | 0 |
| 1991 | 1 | 0 |
| 1992 | 1 | 0 |
| 1993 | 0 | 0 |
| 1994 | 2 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 1 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 0 | 0 |
| 2003 | 0 | 0 |
| 2004 | 0 | 0 |
| 2005 | 0 | 1 |
| 2006 | 1 | 2 |
| 2007 | 0 | 0 |
| 2008 | 1 | 0 |
| 2009 | 1 | 1 |
| 2010 | 1 | 3 |
| 2011 | 0 | 2 |
| 2012 | 2 | 1 |
| 2013 | 0 | 1 |
| 2014 | 1 | 1 |
| 2015 | 0 | 0 |
| 2016 | 2 | 1 |
| 2017 | 0 | 1 |
| 2018 | 1 | 2 |
| 2019 | 3 | 5 |
| 2020 | 2 | 0 |
| 2021 | 2 | 0 |
| 2022 | 0 | 0 |
| 2023 | 0 | 0 |
| 2024 | 0 | 1 |
| 2025 | 0 | 0 |
| 2026 | 0 | 2 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Method of determining a height profile, a measurement system and a computer readable medium5 Oct 2021US 11,137,695 B2ASML Netherlands B. V.
- System and method for performing lithography process in semiconductor device fabrication13 Apr 2021US 10,976,672 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Proximity sensor, lithographic apparatus and device manufacturing method4 Feb 2020US 10,551,182 B2ASML Netherlands B. V.
- Lens contamination prevention device and method21 Jan 2020US 10,539,887 B2Shanghai Micro Electronics Equipment (Group) Co., Ltd.
- Methods for controlling lithographic apparatus, lithographic apparatus and device manufacturing method10 Dec 2019US 10,503,087 B2ASML Netherlands B. V.
- Positioning apparatus, exposure apparatus, air sensor, and article manufacturing method27 Aug 2026US 2026/0251988 A1Canon Kabushiki Kaisha
- Height measurement device, exposure apparatus, and article manufacturing method16 Jul 2026US 2026/0202187 A1Canon Kabushiki Kaisha
- Method, apparatus and computer program for processing a surface of an object11 Apr 2024US 2024/0118632 A1
- A method of determining a height profile, a measurement system and a computer readable medium26 Sep 2019US 2019/0294060 A1ASML Nethertands B.V.
- System and method for performing lithography process in semiconductor device fabrication15 Aug 2019US 2019/0250522 A1Taiwan Semiconductor Manufacturing Company.Ltd
Most cited
By later US patents
- Method and apparatus for transfer of a reticle pattern onto a substrate by scanning103US 5,298,939 A1994
- Alignment and exposure apparatus and method for manufacture of integrated circuits39US 4,937,618 ACanon Kabushiki Kaisha · 1990
- Alignment apparatus33US 4,600,282 ACanon Kabushiki Kaisha · 1986
- Method and apparatus for transfer of a reticle pattern onto a substrate by scanning27US 5,835,195 AMegalpanel Corporation · 1998
- Alignment and exposure apparatus and method for manufacture of integrated circuits24US 5,050,111 ACanon Kabushiki Kaisha · 1991