Method and apparatus for transfer of a reticle pattern onto a substrate by scanning

A photolithographic process for manufacturing electronic devices comprising the steps of:

• substantially locking a reticle mount and a substrate mount together throughout the photolithographic process, the reticle mount for holding a reticle and the substrate mount for holding a substrate;
• and
• providing relative motion of the interlocked reticle mount and substrate mount with respect to an optical relay system and an illumination system in multiple, adjacent, partially overlapping scans wherein the interlocked reticle mount and substrate mount are substantially fixed relative to each other throughout the providing step.