G03F 9/7061
Scanning probe microscopy
Official title: {Scanning probe microscopy, e.g. AFM, scanning tunneling microscopy}
G03F9/7061 (Scanning probe microscopy) appears on 27 US grants and 28 published applications in this corpus.
Search patents in G03F- Granted patents
- 27
- Published applications
- 28
- Assignees
- 20
- Inventors
- 73
- Latest grant
- 1 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1992 | 1 | 0 |
| 1993 | 0 | 0 |
| 1994 | 1 | 0 |
| 1995 | 0 | 0 |
| 1996 | 1 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 1 | 0 |
| 2001 | 0 | 1 |
| 2002 | 0 | 3 |
| 2003 | 2 | 1 |
| 2004 | 1 | 0 |
| 2005 | 2 | 0 |
| 2006 | 0 | 1 |
| 2007 | 0 | 2 |
| 2008 | 0 | 0 |
| 2009 | 2 | 0 |
| 2010 | 0 | 0 |
| 2011 | 1 | 1 |
| 2012 | 0 | 1 |
| 2013 | 0 | 1 |
| 2014 | 1 | 1 |
| 2015 | 0 | 0 |
| 2016 | 0 | 1 |
| 2017 | 0 | 1 |
| 2018 | 2 | 1 |
| 2019 | 2 | 4 |
| 2020 | 1 | 2 |
| 2021 | 3 | 1 |
| 2022 | 2 | 2 |
| 2023 | 1 | 1 |
| 2024 | 1 | 2 |
| 2025 | 1 | 1 |
| 2026 | 1 | 0 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Grid plate encoder based positioning system and method1 Sep 2026US 12,724,038 B2Nearfield Instruments B.V.
- Method and metrology tool for determining information about a target structure, and cantilever probe28 Jan 2025US 12,209,994 B2ASML Netherlands B. V.
- Apparatus and methods for determining the position of a target structure on a substrate12 Mar 2024US 11,927,891 B2ASML Netherlands B. V.
- Apparatus and method for determining a position of an element on a photolithographic mask16 May 2023US 11,650,495 B2Carl Zeiss SMT GmbH
- Apparatus and method for determining a position of an element on a photolithographic mask12 Jul 2022US 11,385,540 B2Carl Zeiss SMT GmbH
- Determining a measurement recipe in a metrology method8 May 2025US 2025/0147429 A1ASML Netherlands B. V.
- Positioning system and method5 Sep 2024US 2024/0295583 A1Nearfield Instruments B.V.
- A stepper lithography apparatus and operating method therefor, and pattern alignment device28 Mar 2024US 2024/0103373 A1Parcan Nanotech Co., Ltd.
- Sub-nanoscale high-precision lithography writing field stitching method, lithography system, wafer, and electron beam drift determination method21 Sep 2023US 2023/0296990 A1Parcan Nanotech Co., Ltd.
- Apparatus and method for determining a position of an element on a photolithographic mask20 Oct 2022US 2022/0334469 A1Carl Zeiss SMT GmbH
Most cited
By later US patents
- Method of detecting positional displacement between mask and wafer, and exposure apparatus adopting the method41US 5,508,527 ACanon Kabushiki Kaisha · 1996
- Exposure apparatus and positioning method35US 6,097,473 ANikon Corporation · 2000
- Alignment method and exposure apparatus using the same34US 6,636,311 B1Canon Kabushiki Kaisha · 2003
- Scanning probe based lithographic alignment33US 6,955,767 B2Hewlett-Packard Development Company, L. P. · 2005
- Nanometer-precision tip-to-substrate control and pattern registration for scanning-probe lithography22US 7,474,410 B2Massachusetts Institute of Technology · 2009