Alignment method and exposure apparatus using the same
AssigneeCanon Kabushiki Kaisha
InventorsHideki Ina, Minoru Yoshii, Masanobu Hasegawa, Takashi Satoh
Life of this patent
Estimating the term…
Abstract
An alignment method for aligning first and second objects, in an exposure apparatus for transferring a pattern of the first object onto the second object as being coated with a resist, includes a process of producing an alignment offset value related to an alignment mark forming region on the second object, after formation of the resist coating thereon, and a process of aligning the first object with the second object as being coated with the resist, in the exposure apparatus, on the basis of the offset value as produced.
Claims5
An exposure apparatus for printing a pattern of a first object on a second object coated with a resist, comprising:
- storing means for storing an alignment offset value related to an alignment mark forming region on the second object, after formation of the resist coating thereon;
- and
- an alignment system for aligning the first object with the second object coated with the resist, on the basis of the offset value;
- wherein the alignment offset value is determined on the basis of (i) information regarding a surface shape of the second object before formation of the resist coating thereon and (ii) information regarding a surface shape of the resist coating formed on the second object.
Dependencies are inferred from the claim text.