Nanometer-precision tip-to-substrate control and pattern registration for scanning-probe lithography
AssigneeMassachusetts Institute of Technology
InventorEuclid E. Moon
Life of this patent
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Abstract
An interferometric-spatial-phase imaging (ISPI) system includes an alignment mechanism for obtaining continuous six-axis control of a scanning probe tip with respect to a coordinate system attached to a substrate. A gap detection mechanism measures tip height above a substrate and controls tip approach toward the substrate of one or more tips, as well as measures tip deflection during surface contact of the one or more tips. A plurality of complementary marks is provided for attachment to the one or more tips. A plurality of grating marks is provided to backdiffract a reflected beam from a flexible cantilever to detect high-frequency tip deflection in a compact configuration of a light source and a light detector.
Claims33
An interferometric-spatial-phase imaging (ISPI) system comprising:
- an alignment mechanism for obtaining continuous six-axis control of a scanning probe tip with respect to a coordinate system attached to a substrate;
- a gap detection mechanism for measuring tip height above the substrate and controlling tip approach toward the substrate of one or more tips, as well as measuring tip deflection during surface contact of said one or more tips;
- a plurality of marks for alignment and gap control of the one or more tips relative to the substrate, as well as for orientation of the one or more tips;
- a plurality of complementary marks for alignment on said substrate;
- and
- a plurality of grating marks to backdiffract a reflected beam from a flexible cantilever to detect high-frequency tip deflection in a compact configuration of a light source and a light detector.
A scanning microscope comprising:
- an alignment mechanism for obtaining continuous six-axis control of a scanning probe tip with respect to a coordinate system attached to a substrate.
- a gap detection mechanism for measuring tip height above the substrate and controlling tip approach toward the substrate of one or more tips, as well as measuring tip deflection during surface contact of said one or more tips;
- a plurality of marks for alignment and gap control of the one or more tips relative to the substrate, as well as for orientation of the one or more tips;
- a plurality of complementary marks for alignment on said substrate;
- and
- a plurality of grating marks to backdiffract a reflected beam from a flexible cantilever to detect high-frequency tip deflection in a compact configuration of a light source and a light detector.
A method of interferometric-spatial-phase imaging comprising:
- obtaining continuous six-axis control of a scanning probe tip with respect to a coordinate system attached to a substrate with an alignment mechanism;
- measuring tip height above the substrate and controlling tip approach toward the substrate of one or more tips, as well as measuring tip deflection during surface contact of said one or more tips with a gap detection mechanism;
- providing a plurality of marks for alignment and gap control of the one or more tips relative to the substrate, as well as for orientation of the one or more tips;
- providing a plurality of complementary marks for alignment on said substrate;
- and
- providing a plurality of grating marks to backdiffract a reflected beam from a flexible cantilever to detect high-frequency tip deflection in a compact configuration of a light source and a light detector.
Dependencies are inferred from the claim text.