Detection device, lithography apparatus, and article manufacturing method

A lithography apparatus for transferring a pattern of an original to a substrate, comprising:

• a detection device for detecting a relative position between a first mark and a second mark respectively provided in a first object and a second object arranged to overlap each other, the detection device comprising:
• an illumination system configured to illuminate the first mark and the second mark with illumination light, wherein the illumination system includes a pinhole plate arranged on the pupil surface of the illumination system, and the illumination light is light that has passed through a pinhole of the pinhole plate;
• and
• a detection system including an image sensor and configured to form an image on an imaging surface of the image sensor from diffracted lights from the first mark and the second mark illuminated by the illumination system,
• wherein the first mark and the second mark are configured to form, on the imaging surface, optical information representing the relative position in a first direction or a second direction orthogonal to the first direction,
• wherein the illumination light is light that passes through only an optical axis of the illumination system and a vicinity of the optical axis on a pupil surface of the illumination system,
• wherein a light blocking body including a first light blocking portion crossing an optical axis of the detection system in a direction parallel to a third direction and a second light blocking portion crossing the optical axis of the detection system in a direction parallel to a fourth direction is provided on a pupil surface of the detection system, and
• wherein the third direction is a direction conjugate to the first direction and the fourth direction is a direction conjugate to the second direction,
• wherein the lithography apparatus is configured to align the original as the first object provided with the first mark and the substrate as the second object provided with the second mark based on an output from the detection device.

An article manufacturing method comprising:

• transferring a pattern of an original to a substrate using a lithography apparatus comprising:
• a detection device for detecting a relative position between a first mark and a second mark respectively provided in a first object and a second object arranged to overlap each other, the detection device comprising:
• an illumination system configured to illuminate the first mark and the second mark with illumination light, wherein the illumination system includes a pinhole plate arranged on the pupil surface of the illumination system, and the illumination light is light that has passed through a pinhole of the pinhole plate;
• and
• a detection system including an image sensor and configured to form an image on an imaging surface of the image sensor from diffracted lights from the first mark and the second mark illuminated by the illumination system,
• wherein the first mark and the second mark are configured to form, on the imaging surface, optical information representing the relative position in a first direction or a second direction orthogonal to the first direction,
• wherein the illumination light is light that passes through only an optical axis of the illumination system and a vicinity of the optical axis on a pupil surface of the illumination system,
• wherein a light blocking body including a first light blocking portion crossing an optical axis of the detection system in a direction parallel to a third direction and a second light blocking portion crossing the optical axis of the detection system in a direction parallel to a fourth direction is provided on a pupil surface of the detection system, and
• wherein the third direction is a direction conjugate to the first direction and the fourth direction is a direction conjugate to the second direction,
• wherein the lithography apparatus is configured to align the original as the first object provided with the first mark and the substrate as the second object provided with the second mark based on an output from the detection device;
• and
• processing the substrate so as to obtain an article from the substrate having undergone the transferring.