G03F 9/7088
Alignment mark detection
Official title: {Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection}
G03F9/7088 (Alignment mark detection) appears on 980 US grants and 993 published applications in this corpus.
Search patents in G03F- Granted patents
- 980
- Published applications
- 993
- Assignees
- 190
- Inventors
- 1,471
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 4 | 0 |
| 1978 | 2 | 0 |
| 1979 | 3 | 0 |
| 1980 | 3 | 0 |
| 1981 | 2 | 0 |
| 1982 | 6 | 0 |
| 1983 | 6 | 0 |
| 1984 | 6 | 0 |
| 1985 | 8 | 0 |
| 1986 | 7 | 0 |
| 1987 | 7 | 0 |
| 1988 | 3 | 0 |
| 1989 | 3 | 0 |
| 1990 | 9 | 0 |
| 1991 | 3 | 0 |
| 1992 | 4 | 0 |
| 1993 | 1 | 0 |
| 1994 | 4 | 0 |
| 1995 | 14 | 0 |
| 1996 | 7 | 0 |
| 1997 | 11 | 0 |
| 1998 | 7 | 0 |
| 1999 | 4 | 0 |
| 2000 | 14 | 0 |
| 2001 | 20 | 5 |
| 2002 | 10 | 19 |
| 2003 | 17 | 22 |
| 2004 | 15 | 48 |
| 2005 | 31 | 50 |
| 2006 | 41 | 74 |
| 2007 | 34 | 60 |
| 2008 | 47 | 59 |
| 2009 | 37 | 58 |
| 2010 | 31 | 37 |
| 2011 | 38 | 43 |
| 2012 | 45 | 40 |
| 2013 | 32 | 27 |
| 2014 | 29 | 23 |
| 2015 | 30 | 34 |
| 2016 | 40 | 30 |
| 2017 | 36 | 31 |
| 2018 | 39 | 40 |
| 2019 | 47 | 46 |
| 2020 | 37 | 40 |
| 2021 | 34 | 28 |
| 2022 | 35 | 44 |
| 2023 | 36 | 49 |
| 2024 | 29 | 31 |
| 2025 | 29 | 22 |
| 2026 | 22 | 33 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Intensity measurements using off-axis illumination6 Oct 2026US 12,754,488 B2ASML Netherlands B. V.
- Metrology method and apparatus8 Sep 2026US 12,730,388 B2ASML Netherlands B. V.
- Measurement apparatus, measurement method, lithography apparatus and article manufacturing method18 Aug 2026US 12,710,263 B2Canon Kabushiki Kaisha
- Method of obtaining array of plurality of regions on substrate, exposure method, exposure apparatus, method of manufacturing article, non-transitory computer-readable storage medium, and information processing apparatus28 Jul 2026US 12,693,604 B2Canon Kabushiki Kaisha
- Method for correcting measurements in the manufacture of integrated circuits and associated apparatuses23 Jun 2026US 12,663,727 B2ASML Netherlands B. V.
- Mark detection method, mark detection apparatus, pattern formation apparatus, and article manufacturing method1 Oct 2026US 2026/0305247 A1Canon Kabushiki Kaisha
- Method for correcting measurements in the manufacture of integrated circuits and associated apparatuses24 Sep 2026US 2026/0288016 A1ASML Netherlands B. V.
- Method and system for creating a stitched design file17 Sep 2026US 2026/0277113 A1APPLIED Materials.Inc.
- Method to stabilize a wavelength of a tunable laser device, tunable laser device, and position measurement system provided with the tunable laser device3 Sep 2026US 2026/0261090 A1ASML Netherlands B. V.
- Detection apparatus, detection method, storage medium, lithography apparatus, and article manufacturing method20 Aug 2026US 2026/0245245 A1Canon Kabushiki Kaisha
Most cited
By later US patents
- Lithographic apparatus and device manufacturing method764US 6,952,253 B2ASML Netherlands B. V. · 2005
- Projection exposure apparatus having an off-axis alignment system and method of alignment therefor744US 5,243,195 ANikon Corporation · 1993
- Position measurement method, position control method, measurement method, loading method, exposure method and exposure apparatus, and device manufacturing method557US 8,072,578 B2Nikon Corporation · 2011
- Exposure apparatus and method548US 6,341,007 B12002
- Signature filter system544US 4,944,036 A1990