Method for correcting measurements in the manufacture of integrated circuits and associated apparatuses

A non-transitory computer program product comprising machine-readable instructions therein, the instructions, upon execution by a computer system, configured to cause the computer system to at least cause performance of a method of metrology comprising:

• illuminating radiation onto a substrate, the radiation having a wavelength that is greater than or equal to 0.1 nm and less than or equal to 100 nm;
• obtaining measurement data relating to at least one measurement of each of one or more structures on the substrate;
• using a Fourier-related transform to transform the measurement data into a transformed measurement data, the transformed measurement data comprising a depth spectrum;
• and
• extracting a feature of the substrate from the transformed measurement data or eliminating an impact of a nuisance parameter.

A metrology apparatus comprising:

• a controller configured to:
• illuminate radiation onto a substrate, the radiation having a wavelength that is greater than or equal to 0.1 nm and less than or equal to 100 nm;
• obtain a measurement data relating to at least one measurement of each of one or more structures on the substrate;
• use a Fourier-related transform to transform the measurement data into a transformed measurement data, the transformed measurement data comprising a depth spectrum;
• and
• extract a feature of the substrate from the transformed measurement data or eliminating an impact of a nuisance parameter.