G03F 9/7096
Arrangement, mounting, housing, environment, cleaning or maintenance of apparatus
Official title: {Arrangement, mounting, housing, environment, cleaning or maintenance of apparatus}
G03F9/7096 (Arrangement, mounting, housing, environment, cleaning or maintenance of apparatus) appears on 139 US grants and 163 published applications in this corpus.
Search patents in G03F- Granted patents
- 139
- Published applications
- 163
- Assignees
- 35
- Inventors
- 347
- Latest grant
- 5 May 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1986 | 1 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 1 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 2 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 3 | 0 |
| 2001 | 4 | 2 |
| 2002 | 1 | 0 |
| 2003 | 2 | 7 |
| 2004 | 4 | 6 |
| 2005 | 5 | 13 |
| 2006 | 7 | 12 |
| 2007 | 14 | 12 |
| 2008 | 8 | 17 |
| 2009 | 4 | 9 |
| 2010 | 9 | 5 |
| 2011 | 5 | 10 |
| 2012 | 8 | 4 |
| 2013 | 3 | 6 |
| 2014 | 6 | 6 |
| 2015 | 4 | 4 |
| 2016 | 8 | 4 |
| 2017 | 2 | 3 |
| 2018 | 6 | 4 |
| 2019 | 7 | 5 |
| 2020 | 6 | 5 |
| 2021 | 3 | 7 |
| 2022 | 4 | 5 |
| 2023 | 1 | 1 |
| 2024 | 7 | 8 |
| 2025 | 3 | 3 |
| 2026 | 1 | 5 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Measurement apparatus5 May 2026US 12,618,667 B2ASML Netherlands B. V.
- Apparatus for assembly of a reticle assembly21 Oct 2025US 12,449,726 B2ASML Netherlands B. V.
- Multiple objectives metrology system, lithographic apparatus, and methods thereof30 Sep 2025US 12,429,780 B2ASML Holding N. V.
- Method of determining a mark measurement sequence, stage apparatus and lithographic apparatus2 Sep 2025US 12,405,542 B2ASML Netherlands B. V.
- Optical designs of miniaturized overlay measurement system12 Nov 2024US 12,140,872 B2ASML Holding N. V.
- Mark position measurement apparatus and mark position measurement method10 Sep 2026US 2026/0266592 A1NuFlare Technology, Inc.
- Measurement device, method of measurement, and method of manufacturing devices6 Aug 2026US 2026/0227709 A1ASML Netherlands B. V.
- Laser processing unit11 Jun 2026US 2026/0161103 A1ORC Manufacturing Co., Ltd.
- On tool metrology scheme for advanced packaging19 Feb 2026US 2026/0050227 A1APPLIED Materials.Inc.
- Design for multiple off-axis illumination beams for wafer alignment sensor15 Jan 2026US 2026/0016762 A1ASML Netherlands B. V.
Most cited
By later US patents
- Off-axis levelling in lithographic projection apparatus103US 6,674,510 B1ASML Netherlands B. V. · 2004
- Exposure apparatus and method for producing device86US 7,388,649 B2Nikon Corporation · 2008
- Exposure apparatus for aligning photosensitive substrate with image plane of a projection optical system75US 6,137,561 ANikon Corporation · 2000
- Exposure apparatus56US 5,633,698 ANixon, Inc. · 1997
- Detection of contamination in imaging systems by fluorescence and/or absorption spectroscopy41US 7,087,907 B1Advanced Micro Devices, Inc. · 2006