Exposure apparatus
AssigneeNixon, Inc.
InventorYuji Imai
Life of this patent
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Abstract
An exposure apparatus comprises a substrate holding portion for holding a photosensitive substrate including a surface, a substrate stage for two-dimensional positioning of the photosensitive substrate via the substrate holding portion, the substrate stage including an upper surface, and an exposure system for transferring a pattern on a mask to the photosensitive substrate by an exposing illumination light. The substrate holding portion is provided in the substrate stage so that the portion of the upper surface of the substrate stage surrounding the photosensitive substrate is substantially flush with the surface of the photosensitive substrate.
Claims14
An exposure apparatus comprising:
- a substrate holding portion for holding a photosensitive substrate including a surface;
- a substrate stage for two-dimensional positioning of said photosensitive substrate via said substrate holding portion, said substrate stage including an upper surface;
- and
- an exposure system for transferring a pattern on a mask to said photosensitive substrate by an exposing illumination light,
- said substrate holding portion being provided in said substrate stage so that the portion of the upper surface of said substrate stage surrounding said photosensitive substrate is substantially flush with the surface of said photosensitive substrate.
Dependencies are inferred from the claim text.