US 12,449,726 B2 · Apparatus for assembly of a reticle assembly

Apparatus for assembly of a reticle assembly

AssigneeASML Netherlands B.V.

InventorsIlya Malakhovsky, Derk Servatius Gertruda Brouns, Joffrey Rene Sylvian Craquelin, Edward Hage, Pieter Renaat Maria Hennus, Jan Willem Adriaan Oosterling, Ludolf Postma, Marcel Duco Snel, Johannes Charles Adrianus Van Den Berg, Wouter Van Der Chijs, Bartel Joris Van Der Veek, Mike Johannes Antonius Van Kuijk, Marina Antoinetta Leonarda Van Uum-Van Herk, Henricus Marinus Theodorus Wiersma

Life of this patent

Estimating the term…

Abstract

An object handling apparatus for handling a generally planar object, the object handling apparatus including: two support arms, at least one of the two support arms movable relative to another support arm generally in a plane such that the two support arms are operable to grip and hold an object disposed in the plane, wherein each of the support arms includes at least one support pad and at least one aligner, the support pads configured to locally contact a surface of the object and apply a force thereto generally perpendicular to the plane so as to support the object and the at least one aligner configured to locally contact a surface of the object and apply a force thereto generally in the plane so as to grip the object.

Claims20

Dependent claims

A pellicle frame attachment apparatus comprising:

a pellicle assembly handling apparatus configured to handle a pellicle assembly and comprising support arms configured to grip and hold the pellicle assembly;
a patterning device handling apparatus configured to handle a patterning device and comprising support arms configured to grip and hold the patterning device;
and
a rail,
wherein the pellicle assembly handling apparatus is supported by and is movable in a direction relative to the rail, wherein the patterning device handling apparatus is supported by and is movable in the same direction relative to the rail, and wherein the relative movement between the pellicle assembly handling apparatus and the patterning device handling apparatus changes a proportion of overlap between the patterning device and the pellicle assembly.

2 more elements

A pellicle frame attachment apparatus comprising:

a pellicle assembly handling apparatus configured to handle a pellicle assembly;
a patterning device handling apparatus configured to handle a patterning device;
a first track;
and
a second track of which at least part is substantially parallel to the first track,
wherein the pellicle assembly handling apparatus is supported by and is movable relative to the first track, wherein the patterning device handling apparatus is supported by and is movable relative to the second track, and wherein relative movement between the pellicle assembly handling apparatus and the patterning device handling apparatus changes a proportion of overlap between the patterning device and the pellicle assembly.

3 more elements

A pellicle frame attachment apparatus comprising:

a pellicle assembly handling apparatus configured to handle a pellicle assembly;
a patterning device handling apparatus configured to handle a patterning device;
and
a support configured to support both the pellicle assembly handling apparatus and patterning device handling apparatus,
wherein the pellicle assembly handling apparatus is movable relative to the support in a direction, wherein the patterning device handling apparatus is movable relative to the support in the same direction, and wherein the relative movement between the pellicle assembly handling apparatus and the patterning device handling apparatus changes a proportion of overlap between the patterning device and the pellicle assembly.

2 more elements

Dependencies are inferred from the claim text.

Facts

Application

17/433,038Filed 25 Feb 2020

Priority

EP 1915994328 Feb 2019

Published

US 2022/0155675 A119 May 2022

Granted

21 Oct 2025

Term ends

Not estimatedThe source records don’t support an estimate.

Classification12 codes

G03F 1/62
Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles…
G03F 1/64
Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof: characterised by the frames, e.g. structure or…
G03F 1/24
Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation…
G03F 7/70716
Handling of masks or workpieces: stages