G03F 9/7003
Alignment type or strategy
Official title: {Alignment type or strategy, e.g. leveling, global alignment}
G03F9/7003 (Alignment type or strategy) appears on 2,247 US grants and 2,221 published applications in this corpus.
Search patents in G03F- Granted patents
- 2,247
- Published applications
- 2,221
- Assignees
- 362
- Inventors
- 3,396
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 0 | 0 |
| 1978 | 0 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 5 | 0 |
| 1983 | 5 | 0 |
| 1984 | 9 | 0 |
| 1985 | 13 | 0 |
| 1986 | 26 | 0 |
| 1987 | 22 | 0 |
| 1988 | 9 | 0 |
| 1989 | 18 | 0 |
| 1990 | 8 | 0 |
| 1991 | 10 | 0 |
| 1992 | 21 | 0 |
| 1993 | 14 | 0 |
| 1994 | 15 | 0 |
| 1995 | 13 | 0 |
| 1996 | 13 | 0 |
| 1997 | 20 | 0 |
| 1998 | 24 | 0 |
| 1999 | 25 | 0 |
| 2000 | 34 | 0 |
| 2001 | 43 | 28 |
| 2002 | 58 | 57 |
| 2003 | 62 | 70 |
| 2004 | 49 | 83 |
| 2005 | 68 | 109 |
| 2006 | 91 | 130 |
| 2007 | 80 | 118 |
| 2008 | 76 | 93 |
| 2009 | 66 | 111 |
| 2010 | 71 | 76 |
| 2011 | 64 | 78 |
| 2012 | 64 | 57 |
| 2013 | 79 | 78 |
| 2014 | 65 | 59 |
| 2015 | 69 | 91 |
| 2016 | 84 | 84 |
| 2017 | 70 | 85 |
| 2018 | 96 | 100 |
| 2019 | 121 | 128 |
| 2020 | 119 | 111 |
| 2021 | 106 | 95 |
| 2022 | 78 | 84 |
| 2023 | 79 | 92 |
| 2024 | 64 | 82 |
| 2025 | 71 | 59 |
| 2026 | 49 | 63 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
- G03F 9/7023Aligning or positioning in direction perpendicular to substrate surface960
- G03F 9/7007Alignment other than original with workpiece451
- G03F 9/7046Strategy414
- G03F 9/7042Alignment for lithographic apparatus using patterning methods other than those involving the235
- G03F 9/7019Calibration181
- G03F 9/7038Alignment for proximity or contact printer85
Recent patents
- Pattern forming method, semiconductor device manufacturing method, and template6 Oct 2026US 12,754,487 B2Kioxia Corporation
- Intensity measurements using off-axis illumination6 Oct 2026US 12,754,488 B2ASML Netherlands B. V.
- Method for determining a focus actuation profile for one or more actuators of a lithographic exposure apparatus22 Sep 2026US 12,743,034 B2ASML Netherlands B. V.
- Method of spatially aligning a patterning device and a substrate22 Sep 2026US 12,743,035 B2ASML Netherlands B. V.
- Alignment method based on holographic lithography, system and device22 Sep 2026US 12,743,036 B2Hyper-Optics (Beijing) Technologies Ltd.
- System and Process for Imprinting8 Oct 2026US 2026/0310071 A1Morphotonics Holding B.V.
- Nanoimprint lithography mold and nanoimprint lithography using same8 Oct 2026US 2026/0310109 A1Taiwan Semiconductor Manufacturing Company.Ltd
- System and Process for Imprinting1 Oct 2026US 2026/0299444 A1Morphotonics Holding B.V.
- Mark detection method, mark detection apparatus, pattern formation apparatus, and article manufacturing method1 Oct 2026US 2026/0305247 A1Canon Kabushiki Kaisha
- Scalable nanoimprint manufacturing of functional multi-layer metasurface devices24 Sep 2026US 2026/0287787 A1Arizona Board of Regents on behalf of Arizona State University
Most cited
By later US patents
- Focusing and tilting adjustment system for lithography aligner, manufacturing apparatus or inspection apparatus1,042US 5,825,043 ANikon Precision Inc. · 1998
- Projection exposure apparatus and method with workpiece area detection611US 6,191,429 B1Nikon Precision Inc. · 2001
- Projection exposure apparatus and method605US 6,122,036 ANikon Corporation · 2000
- Position measurement method, position control method, measurement method, loading method, exposure method and exposure apparatus, and device manufacturing method557US 8,072,578 B2Nikon Corporation · 2011
- Method and apparatus for repetitively projecting a mask pattern on a substrate, using a time-saving height measurement549US 6,208,407 B1ASM Lithography B. V. · 2001