Alignment for lithographic apparatus using patterning methods other than those involving the

Official title: {Alignment for lithographic apparatus using patterning methods other than those involving the exposure to radiation, e.g. by stamping or imprinting (non-exposure lithographic processes per se G03F7/0002)}

G03F9/7042 (Alignment for lithographic apparatus using patterning methods other than those involving the) appears on 235 US grants and 300 published applications in this corpus.