Managing multi-objective alignments for imprinting

An imprinting system comprising:

• rollers for moving a template roll, wherein the template roll comprises a template field having a template with a template fiducial mark;
• a movable stage for holding a substrate;
• a moving system for moving the stage together with the substrate;
• a resist dispenser for dispensing resist on a side of the substrate;
• a light source for curing the resist, wherein the light source is configured to cure the resist to form an imprint on the side of the substrate when the template of the template roll is pressed into the resist on the side of the substrate, the imprint having an imprinted feature corresponding to the template and an imprint fiducial mark corresponding to the template fiducial mark of the template;
• a first inspection system for registering the template fiducial mark of the template in a coordinate system to determine a template offset;
• a second inspection system for registering the imprint on the substrate in the coordinate system to determine a wafer registration offset between a target fiducial location and an actual fiducial location associated with the imprint fiducial mark;
• and
• a controller configured to:
• control the moving system to move the substrate with the resist to be below the template of the template roll based on an imprinting alignment offset, the imprinting alignment offset being at least partially determined based on the template offset, and
• determine an overlay bias of the imprint on the side of the substrate to be at least partially based on the wafer registration offset.