Imprinting method, imprint apparatus and article manufacturing method

An article manufacturing method, comprising:

• pattern-forming of forming a pattern on a substrate using an imprint apparatus having:
• a moving unit configured to relatively move a mold and the substrate so that a pattern portion of the mold is contacted to an imprint material on a pattern-forming region;
• a pressing unit configured to press the contacted pattern portion and the imprint material on the pattern-forming region by applying a pressure between the mold and the pattern-forming region to widen a contact area between the mold and the imprint material in the pattern-forming region, and decompress the contacted pattern portion by decreasing the pressure between the mold and the pattern-forming region to put at least the contacted pattern portion into a flat state after the pressing is completed;
• and
• a control unit configured to control the moving unit so that the mold and the pattern-forming region are relatively aligned based on a positional relationship between the mold and an alignment mark of the pattern-forming region,
• in which the control unit is further configured to determine a timing of beginning the aligning between the mold and the pattern-forming region based on whether a variation in relative positions between the mold and the pattern-forming region during the decompressing is within a permissible range, such that the aligning begins during a period of the decompressing if an area in a pattern-forming region where the pattern can be formed is a second area corresponding to a full field region having a contour that is not limited by the edge of the substrate, the second area being wider than a first area corresponding to a partial field region having a contour that is limited by an edge of the substrate;
• processing the substrate on which the pattern is formed in the pattern-forming;
• and
• manufacturing an article from the substrate processed in the processing.