G03F 9/7019
Calibration
Official title: {Calibration}
G03F9/7019 (Calibration) appears on 181 US grants and 226 published applications in this corpus.
Search patents in G03F- Granted patents
- 181
- Published applications
- 226
- Assignees
- 52
- Inventors
- 471
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1998 | 1 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 1 |
| 2002 | 0 | 3 |
| 2003 | 1 | 7 |
| 2004 | 4 | 7 |
| 2005 | 6 | 16 |
| 2006 | 9 | 22 |
| 2007 | 10 | 10 |
| 2008 | 7 | 10 |
| 2009 | 8 | 18 |
| 2010 | 10 | 4 |
| 2011 | 5 | 9 |
| 2012 | 7 | 4 |
| 2013 | 10 | 8 |
| 2014 | 6 | 7 |
| 2015 | 8 | 8 |
| 2016 | 8 | 4 |
| 2017 | 7 | 6 |
| 2018 | 8 | 10 |
| 2019 | 13 | 16 |
| 2020 | 16 | 16 |
| 2021 | 13 | 3 |
| 2022 | 3 | 7 |
| 2023 | 6 | 11 |
| 2024 | 6 | 3 |
| 2025 | 5 | 7 |
| 2026 | 4 | 9 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Intensity measurements using off-axis illumination6 Oct 2026US 12,754,488 B2ASML Netherlands B. V.
- Method of spatially aligning a patterning device and a substrate22 Sep 2026US 12,743,035 B2ASML Netherlands B. V.
- Gap detection system and method, and focal plane correction method4 Aug 2026US 12,699,332 B2The Institute of Optics and Electronics, The Chinese Academy of Sciences
- Metrology mark structure and method of determining metrology mark structure24 Mar 2026US 12,585,201 B2ASML Holding N. V.
- Metrology method and associated metrology and lithographic apparatuses30 Sep 2025US 12,429,781 B2ASML Netherlands B. V.
- Mark detection method, mark detection apparatus, pattern formation apparatus, and article manufacturing method1 Oct 2026US 2026/0305247 A1Canon Kabushiki Kaisha
- Method of predicting performance of a lithographic apparatus, calibration of lithographic apparatus, device manufacturing method20 Aug 2026US 2026/0244111 A1ASML Netherlands B. V.
- Substrates for calibration of a lithographic apparatus23 Jul 2026US 2026/0211337 A1ASML Netherlands B. V.
- Height measurement device, exposure apparatus, and article manufacturing method16 Jul 2026US 2026/0202187 A1Canon Kabushiki Kaisha
- Calibration method and apparatus9 Jul 2026US 2026/0194341 A1ASML Netherlands B. V.
Most cited
By later US patents
- Lithographic apparatus and method for calibrating the same112US 7,256,871 B2ASML Netherlands B. V. · 2007
- Lithographic apparatus and method for calibrating the same106US 7,292,312 B2ASML Netherlands B. V. · 2007
- Lithographic apparatus and method for determining Z position errors/variations and substrate table flatness106US 7,333,174 B2ASML Netherlands B. V. · 2008
- Lithographic apparatus and device manufacturing method78US 7,619,207 B2ASML Netherlands B. V. · 2009
- Lithographic apparatus and method for calibrating the same60US 7,408,655 B2ASML Netherlands B. V. · 2008