Method of predicting performance of a lithographic apparatus, calibration of lithographic apparatus, device manufacturing method

A method of calibrating a lithographic apparatus, the method comprising:

• providing calibration data relating to a plurality of fields that have been exposed by the lithographic apparatus on one or more substrates, wherein a field exposure time, time between exposures or a related parameter is varied for at least two fields of the plurality of fields;
• generating a performance model based on the calibration data;
• and
• using the performance model to determine a set of parameter of interest data for a first plurality of product fields based at least upon field exposure time data describing field exposure times or a related parameter for the first plurality of product fields;
• and
• based on the set of parameter of interest data, supplying corrections to be used by the lithographic apparatus when applying product fields on a product substrate using at least a product field exposure time layout.