Calibration method and apparatus
AssigneeASML Netherlands B.V.
InventorsSjoerd Nicolaas Lambertus DONDERS, Carsten MÄDLER, Peter Fernand William Jozef DENDAS
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Abstract
A method for calibrating a height measuring optical sensor for a substrate in a lithographic apparatus. The method comprises determining, using the height measuring optical sensor, a first height of a surface of the substrate within a region of interest. The method further comprises determining, using a scanning probe microscope, a second height of the surface of the substrate within the region of interest. The method further comprises determining a calibration map for the height measuring optical sensor for the region of interest, by comparing the first height and the second height.
Claims10
1-16. (canceled)
A method comprising:
- determining, using a height measuring optical sensor, a first height of a surface of a substrate within a region of interest;
- determining, using one of a plurality of scanning probe microscopes, a second height of the surface of the substrate within the region of interest;
- and
- determining a calibration map for the height measuring optical sensor for the region of interest, by comparing the first height and the second height.
An apparatus comprising:
- a height measuring optical sensor configured to determine a first height of a surface of a substrate within a region of interest;
- a plurality of scanning probe microscopes configured to determine a second height of the surface of the substrate within the region of interest;
- and
- a processor configured to determine a calibration map for the height measuring optical sensor for the region of interest, by comparing the first height and the second height.
A method comprising:
- determining a height of a reference point;
- and
- determining, using a plurality of scanning probe microscopes, the height of a surface of a substrate at one or more points.
Dependencies are inferred from the claim text.