G03F 9/7007
Alignment other than original with workpiece
Official title: {Alignment other than original with workpiece}
G03F9/7007 (Alignment other than original with workpiece) appears on 451 US grants and 479 published applications in this corpus.
Search patents in G03F- Granted patents
- 451
- Published applications
- 479
- Assignees
- 126
- Inventors
- 838
- Latest grant
- 4 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1982 | 1 | 0 |
| 1983 | 1 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 1 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 1 | 0 |
| 1992 | 1 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 1 | 0 |
| 1996 | 0 | 0 |
| 1997 | 2 | 0 |
| 1998 | 7 | 0 |
| 1999 | 4 | 0 |
| 2000 | 10 | 0 |
| 2001 | 12 | 12 |
| 2002 | 9 | 12 |
| 2003 | 16 | 24 |
| 2004 | 16 | 27 |
| 2005 | 22 | 47 |
| 2006 | 36 | 46 |
| 2007 | 34 | 44 |
| 2008 | 26 | 26 |
| 2009 | 22 | 28 |
| 2010 | 18 | 17 |
| 2011 | 16 | 19 |
| 2012 | 19 | 13 |
| 2013 | 17 | 15 |
| 2014 | 13 | 9 |
| 2015 | 15 | 13 |
| 2016 | 14 | 17 |
| 2017 | 11 | 10 |
| 2018 | 21 | 12 |
| 2019 | 16 | 23 |
| 2020 | 21 | 22 |
| 2021 | 13 | 8 |
| 2022 | 11 | 5 |
| 2023 | 8 | 12 |
| 2024 | 7 | 4 |
| 2025 | 6 | 7 |
| 2026 | 3 | 7 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Self-aligned ridge waveguide laser structure, method for fabrication, and method for use with interposer-based pics4 Aug 2026US 12,699,331 B2
- Measurement system, substrate processing system, and device manufacturing method26 May 2026US 12,638,788 B2Nikon Corporation
- Lithographic pre-alignment imaging sensor with build-in coaxial illumination13 Jan 2026US 12,523,941 B2ASML Holding N. V.
- Metrology method and associated metrology and lithographic apparatuses30 Sep 2025US 12,429,781 B2ASML Netherlands B. V.
- Detection device, detection method, lithography apparatus, and article manufacturing method12 Aug 2025US 12,386,276 B2Canon Kabushiki Kaisha
- Measurement system, substrate processing system, and device manufacturing method20 Aug 2026US 2026/0244118 A1Nikon Corporation
- Determination method, pattern transfer method, article manufacturing method, medium, information processing apparatus, and lithography system23 Jul 2026US 2026/0211345 A1Canon Kabushiki Kaisha
- Height measurement device, exposure apparatus, and article manufacturing method16 Jul 2026US 2026/0202187 A1Canon Kabushiki Kaisha
- Substrate processing method, substrate processing device, lithography device, and article manufacturing method25 Jun 2026US 2026/0182308 A1Canon Kabushiki Kaisha
- Device alignment for correcting substrate angle11 Jun 2026US 2026/0161102 A1Onto Innovation Inc.
Most cited
By later US patents
- Position measurement method, position control method, measurement method, loading method, exposure method and exposure apparatus, and device manufacturing method557US 8,072,578 B2Nikon Corporation · 2011
- Exposure apparatus and method548US 6,341,007 B12002
- Exposure apparatus and method473US 6,590,634 B1Nikon Corporation · 2003
- Projection exposure apparatus and method398US 6,400,441 B1Nikon Corporation · 2002
- Exposure apparatus and an exposure method321US 6,549,269 B1Nikon Corporation · 2003