Measurement system, substrate processing system, and device manufacturing method
AssigneeNikon Corporation
InventorsGo Ichinose, Yuichi Shibazaki
Life of this patent
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Abstract
A measurement system to be used in a micro-device manufacturing line is equipped with: a plurality of measurement devices which performs measurement processing on each substrate; and a controller that can control the plurality of measurement devices, and the plurality of measurement devices includes at least one first measurement device which acquires position information of a plurality of marks formed on a substrate.
Claims16
A measurement system used in a manufacturing line for micro-devices, the measurement system comprising:
- a first measurement device which acquires position information of a plurality of marks formed on a substrate, the first measurement device including a movable stage configured to hold the substrate and a detection system configured to detect the plurality of marks formed on the substrate;
- and
- a controller which is configured to control the first measurement device, wherein
- the first measurement device acquires absolute position information of a plurality of marks in each of divided areas formed on an mth layer (m is an integral number of 1 or more) of the substrate on which an exposure process and a developing process have been performed, and
- the measurement system outputs information that is obtained based on the absolute position information of the plurality of marks in each of the divided areas formed on the mth layer of the substrate to an exposure apparatus having performed the exposure process on the mth layer of the substrate, the information is to be utilized for correcting an arrangement of a plurality of divided areas and/or a shape of each of the plurality of divided areas on the mth layer of another substrate in performing the exposure process by the exposure apparatus used for exposure of the mth layer.
A measurement system used in a manufacturing line for micro-devices, the measurement system comprising:
- a first measurement device including a movable stage configured to hold a substrate and a detection system configured to detect a plurality of marks formed on the substrate, wherein the first measurement device acquires absolute position information of the plurality of marks formed on an mth layer (m is an integral number of 1 or more) on the substrate and absolute position information of a plurality of marks formed on an nth layer (n is an integral number of 2 or more and is larger than m) of the substrate, respectively, and makes a determination of whether an overlay displacement between the mth layer and the nth layer is caused mainly by one of the mth layer and the nth layer, based on the absolute position information of the plurality of marks formed on the mth layer and the absolute position information of the plurality of marks formed on the nth layer.
Dependencies are inferred from the claim text.