Determination method, pattern transfer method, article manufacturing method, medium, information processing apparatus, and lithography system
AssigneeCanon Kabushiki Kaisha
InventorMasaharu KAJITANI
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Abstract
A determination method includes a generation step of generating correction measurement data by removing a component dependent on an array of a plurality of shot regions of a first substrate onto which a pattern is transferred by a lithography apparatus from measurement data of the first substrate; and a determination step of determining a correction value to be provided to the lithography apparatus when transferring a pattern onto a second substrate by using the lithography apparatus based on the correction measurement data and an array of a plurality of shot regions of the second substrate.
Claims16
A determination method comprising:
- a generation step of generating correction measurement data by removing a component dependent on an array of a plurality of shot regions of a first substrate onto which a pattern is transferred by a lithography apparatus from measurement data of the first substrate;
- and
- a determination step of determining a correction value to be provided to the lithography apparatus when transferring a pattern onto a second substrate by using the lithography apparatus based on the correction measurement data and an array of a plurality of shot regions of the second substrate.
An information processing apparatus comprising:
- a generating unit configured to generate correction measurement data by removing a component dependent on an array of a plurality of shot regions of a first substrate onto which a pattern is transferred by a lithography apparatus from measurement data of the first substrate;
- and
- a determination unit configured to determine a correction value to be provided to the lithography apparatus when transferring a pattern onto a second substrate by using the lithography apparatus based on the correction measurement data and an array of a plurality of shot regions of the second substrate.
A lithography system including a lithography apparatus, the system comprising:
- a generating unit configured to generate correction measurement data by removing a component dependent on an array of a plurality of shot regions of a first substrate onto which a pattern is transferred by a lithography apparatus from measurement data of the first substrate;
- and
- a determination unit configured to determine a correction value to be used when transferring a pattern onto a second substrate based on the correction measurement data and an array of a plurality of shot regions of the second substrate,
- wherein a pattern is transferred onto the plurality of shot regions of the second substrate by the lithography apparatus while controlling the lithography apparatus in accordance with the correction value.
Dependencies are inferred from the claim text.