G03F 9/7011
Pre-exposure scan
Official title: {Pre-exposure scan; original with original holder alignment; Prealignment, i.e. workpiece with workpiece holder}
G03F9/7011 (Pre-exposure scan) appears on 288 US grants and 329 published applications in this corpus.
Search patents in G03F- Granted patents
- 288
- Published applications
- 329
- Assignees
- 90
- Inventors
- 581
- Latest grant
- 26 May 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1982 | 1 | 0 |
| 1983 | 1 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 1 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 1 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 3 | 0 |
| 1999 | 2 | 0 |
| 2000 | 5 | 0 |
| 2001 | 6 | 6 |
| 2002 | 4 | 8 |
| 2003 | 7 | 20 |
| 2004 | 9 | 19 |
| 2005 | 15 | 38 |
| 2006 | 30 | 39 |
| 2007 | 27 | 35 |
| 2008 | 19 | 18 |
| 2009 | 18 | 23 |
| 2010 | 18 | 12 |
| 2011 | 12 | 16 |
| 2012 | 11 | 8 |
| 2013 | 15 | 10 |
| 2014 | 7 | 6 |
| 2015 | 11 | 4 |
| 2016 | 5 | 10 |
| 2017 | 5 | 5 |
| 2018 | 11 | 9 |
| 2019 | 11 | 8 |
| 2020 | 8 | 12 |
| 2021 | 3 | 2 |
| 2022 | 7 | 4 |
| 2023 | 5 | 6 |
| 2024 | 5 | 3 |
| 2025 | 3 | 3 |
| 2026 | 2 | 5 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Measurement system, substrate processing system, and device manufacturing method26 May 2026US 12,638,788 B2Nikon Corporation
- Lithographic pre-alignment imaging sensor with build-in coaxial illumination13 Jan 2026US 12,523,941 B2ASML Holding N. V.
- Metrology method and associated metrology and lithographic apparatuses30 Sep 2025US 12,429,781 B2ASML Netherlands B. V.
- Reticle pod including motion limiting features and method of assembling same15 Apr 2025US 12,276,924 B2Entegris, Inc.
- Method and system of surface topography measurement for lithography7 Jan 2025US 12,189,306 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Measurement system, substrate processing system, and device manufacturing method20 Aug 2026US 2026/0244118 A1Nikon Corporation
- Determination method, pattern transfer method, article manufacturing method, medium, information processing apparatus, and lithography system23 Jul 2026US 2026/0211345 A1Canon Kabushiki Kaisha
- Substrate processing method, substrate processing device, lithography device, and article manufacturing method25 Jun 2026US 2026/0182308 A1Canon Kabushiki Kaisha
- Device alignment for correcting substrate angle11 Jun 2026US 2026/0161102 A1Onto Innovation Inc.
- Exposure apparatus, article manufacturing method, and control method23 Apr 2026US 2026/0110978 A1Canon Kabushiki Kaisha
Most cited
By later US patents
- Position measurement method, position control method, measurement method, loading method, exposure method and exposure apparatus, and device manufacturing method557US 8,072,578 B2Nikon Corporation · 2011
- Lithographic apparatus and method for calibrating the same112US 7,256,871 B2ASML Netherlands B. V. · 2007
- Lithographic apparatus and method for calibrating the same106US 7,292,312 B2ASML Netherlands B. V. · 2007
- Lithographic apparatus and method for determining Z position errors/variations and substrate table flatness106US 7,333,174 B2ASML Netherlands B. V. · 2008
- Scanning exposure apparatus101US 6,992,751 B2Nikon Corporation · 2006