Litel Instruments
San Diego, CA, US· latest recorded location
Litel Instruments is named on 71 US grants and 29 published applications in this corpus. Its most frequent classification is G03F (Photomechanical production of textured or patterned surfaces).
- Granted patents
- 71
- Published applications
- 29
- Inventors
- 13
- Granted in 2026 so far
- 0
- Most recent grant
- 5 Mar 2019
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1992 | 3 | 0 |
| 1993 | 1 | 0 |
| 1994 | 3 | 0 |
| 1995 | 1 | 0 |
| 1996 | 9 | 0 |
| 1997 | 6 | 0 |
| 1998 | 4 | 0 |
| 1999 | 2 | 0 |
| 2000 | 1 | 0 |
| 2001 | 1 | 0 |
| 2002 | 1 | 2 |
| 2003 | 1 | 1 |
| 2004 | 2 | 4 |
| 2005 | 5 | 9 |
| 2006 | 5 | 5 |
| 2007 | 9 | 5 |
| 2008 | 3 | 1 |
| 2009 | 3 | 0 |
| 2010 | 4 | 0 |
| 2011 | 2 | 0 |
| 2012 | 0 | 0 |
| 2013 | 0 | 0 |
| 2014 | 1 | 0 |
| 2015 | 1 | 1 |
| 2016 | 1 | 0 |
| 2017 | 0 | 1 |
| 2018 | 1 | 0 |
| 2019 | 1 | 0 |
By publication year.
Technology areas
Share of 100 documents
- G03FPhotomechanical production of textured or patterned surfaces76
- Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests16
- G02BOptical elements, systems or apparatus14
- B23KSoldering or unsoldering13
- G03BApparatus or arrangements for taking photographs or for projecting or viewing them12
- H05KPrinted circuits9
- H01JElectric discharge tubes or discharge lamps8
- B82YSpecific uses or applications of nanostructures7
- G03HHolographic processes or apparatus7
- G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of6
Recent patents
- Precision geographic location system and method utilizing an image product5 Mar 2019US 10,222,178 B1
- System and method for advanced navigation27 Feb 2018US 9,903,719 B2
- Method and system for high accuracy and reliability registration of multi modal imagery1 Nov 2016US 9,483,816 B2
- Precision geographic location system and method utilizing an image product7 Jul 2015US 9,074,848 B1
- Method and apparatus for measurement of exit pupil transmittance22 Jul 2014US 8,786,827 B2
- System and method for advanced navigation26 Jan 2017US 2017/0023365 A1
- Method & system for high accuracy & reliability registration of multi modal imagery12 Nov 2015US 2015/0324989 A1
- In-Situ Interferometer Arrangement10 Jan 2008US 2008/0007705 A1
- Method And Apparatus For Self-Referenced Wafer Stage Positional Error Mapping6 Dec 2007US 2007/0279607 A1
- Reference Wafer and Process for Manufacturing Same20 Sep 2007US 2007/0216902 A1
Most cited
By later US patents
- Apparatus, method of measurement, and method of data analysis for correction of optical system106US 5,828,455 A1998
- Apparatus method of measurement and method of data analysis for correction of optical system93US 5,978,085 A1999
- Laser ablation control system and method92US 5,523,543 A1996
- Apparatus and process for nozzle production utilizing computer generated holograms74US 6,130,009 A2000
- Deformable wafer chuck69US 5,094,536 A1992